Invention Application
- Patent Title: COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD
- Patent Title (中): 基于组分和自转自组装方法
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Application No.: US14691043Application Date: 2015-04-20
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Publication No.: US20150301445A1Publication Date: 2015-10-22
- Inventor: Hiroyuki Komatsu , Takehiko Naruoka , Shinya Minegishi , Kaori Sakai , Tomoki Nagai
- Applicant: JSR CORPORATION
- Applicant Address: JP Tokyo
- Assignee: JSR CORPORATION
- Current Assignee: JSR CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2014-087752 20140421
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G02F1/1333 ; H01L21/311 ; C08L25/14 ; G03F7/16
Abstract:
A composition for a base of a directed self-assembling film includes a compound including an oxo acid group, and a solvent. The compound is preferably represented by formula (1). A represents an organic group having 10 or more carbon atoms and having a valency of n. B represents an oxo acid group. n is an integer of 1 to 200. In a case where n is 2 or greater, a plurality of Bs are identical or different. AB)n (1)
Public/Granted literature
- US09690192B2 Composition for base, and directed self-assembly lithography method Public/Granted day:2017-06-27
Information query
