发明申请
- 专利标题: THREE-DIMENSIONAL SEMICONDUCTOR MEMORY DEVICES AND METHODS OF FABRICATING THE SAME
- 专利标题(中): 三维半导体存储器件及其制造方法
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申请号: US14796569申请日: 2015-07-10
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公开(公告)号: US20150311301A1公开(公告)日: 2015-10-29
- 发明人: Kwang Soo Seol , Chanjin Park , Kihyun Hwang , Hanmei Choi , Sunghoi Hur , Wansik Hwang , Toshiro Nakanishi , Kwangmin Park , Juyul Lee
- 申请人: Kwang Soo Seol , Chanjin Park , Kihyun Hwang , Hanmei Choi , Sunghoi Hur , Wansik Hwang , Toshiro Nakanishi , Kwangmin Park , Juyul Lee
- 优先权: KR10-2010-0027449 20100326; KR10-2010-0055098 20100610; KR10-2010-0064413 20100705; KR10-2010-0064415 20100705; KR10-2010-0084971 20100831
- 主分类号: H01L29/423
- IPC分类号: H01L29/423 ; H01L27/115 ; H01L29/51 ; H01L29/792
摘要:
Three-dimensional semiconductor memory devices and methods of fabricating the same. The three-dimensional semiconductor devices include an electrode structure with sequentially-stacked electrodes disposed on a substrate, semiconductor patterns penetrating the electrode structure, and memory elements including a first pattern and a second pattern interposed between the semiconductor patterns and the electrode structure, the first pattern vertically extending to cross the electrodes and the second pattern horizontally extending to cross the semiconductor patterns.
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