Invention Application
US20150328668A1 SUBSTRATE LIQUID TREATMENT APPARATUS, METHOD OF CLEANING SUBSTRATE LIQUID TREATMENT APPARATUS AND NON-TRANSITORY STORAGE MEDIUM
审中-公开
基板液体处理装置，清洗基板液体处理装置和非储存储存介质的方法
- Patent Title: SUBSTRATE LIQUID TREATMENT APPARATUS, METHOD OF CLEANING SUBSTRATE LIQUID TREATMENT APPARATUS AND NON-TRANSITORY STORAGE MEDIUM
- Patent Title (中): 基板液体处理装置，清洗基板液体处理装置和非储存储存介质的方法
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Application No.: US14713275Application Date: 2015-05-15
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Publication No.: US20150328668A1Publication Date: 2015-11-19
- Inventor: Kazuya KOYAMA , Hiromi KIYOSE , Katsufumi MATSUKI , Shuhei TAKAHASHI , Hideki NISHIMURA , Takashi UNO , Hirotaka MARUYAMA
- Applicant: TOKYO ELECTRON LIMITED
- Priority: JP2014-102540 20140516
- Main IPC: B08B9/032
- IPC: B08B9/032 ; H01L21/67
Abstract:
A substrate liquid treatment apparatus includes: at least one processing unit that processes a substrate with a treatment liquid; a storage tank that stores the treatment liquid; a circulation line through which the treatment liquid discharged from the storage tank into the circulation line is returned to the storage tank; a branch supply line that is branched from the circulation line to supply the treatment liquid to the processing unit; a recovery line that returns to the storage tank the treatment liquid having been supplied to the substrate in the processing unit; a distribution line connecting the circulation line and the recovery line; and a shutoff valve, provided on the distribution line, that is opened when cleaning of the recovery line is performed.
Public/Granted literature
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