公开(公告)号：US20240238848A1

公开(公告)日：2024-07-18

申请号：US18410113

申请日：2024-01-11

Applicant: Tokyo Electron Limited

Inventor： Takafumi KINOSHITA ,  Yuki ITO ,  Daisuke SAIKI ,  Tomoyuki HASHIMOTO ,  Yoshifumi AMANO ,  Kazuhiro AIURA ,  Akira FUJITA ,  Shuhei TAKAHASHI

IPC: B08B3/02 ,  H01L21/67

CPC classification number: B08B3/022 ,  H01L21/67051 ,  B08B2203/02

Abstract: A substrate processing apparatus includes a support unit, a supply unit, an annular member, a rotation unit, a cover member, and an annular flow regulation member disposed above the cover member. The annular member includes an inclined surface inclined downward toward a center of the annular member in a radial direction. The flow regulation member includes a base portion and a protrusion which faces a circumferential portion of the substrate supported on the support unit and protrudes from the base portion toward the circumferential portion of the substrate. The protrusion overlaps the support unit when viewed in a vertical direction. A lower surface of the protrusion is positioned above an upper surface of the substrate supported on the support unit and positioned below an upper surface of the annular member. An inner circumferential surface of the protrusion is inclined radially outward from an upper side to a lower side.

公开(公告)号：US20150328668A1

公开(公告)日：2015-11-19

申请号：US14713275

申请日：2015-05-15

Applicant: TOKYO ELECTRON LIMITED

Inventor： Kazuya KOYAMA ,  Hiromi KIYOSE ,  Katsufumi MATSUKI ,  Shuhei TAKAHASHI ,  Hideki NISHIMURA ,  Takashi UNO ,  Hirotaka MARUYAMA

IPC: B08B9/032 ,  H01L21/67

CPC classification number: H01L21/67017 ,  B08B9/032 ,  H01L21/67023

Abstract: A substrate liquid treatment apparatus includes: at least one processing unit that processes a substrate with a treatment liquid; a storage tank that stores the treatment liquid; a circulation line through which the treatment liquid discharged from the storage tank into the circulation line is returned to the storage tank; a branch supply line that is branched from the circulation line to supply the treatment liquid to the processing unit; a recovery line that returns to the storage tank the treatment liquid having been supplied to the substrate in the processing unit; a distribution line connecting the circulation line and the recovery line; and a shutoff valve, provided on the distribution line, that is opened when cleaning of the recovery line is performed.

Abstract translation: 基板液体处理装置包括：至少一个处理单元，其用处理液处理基板; 存储处理液的储罐; 从储罐排入循环管线的处理液通过该循环管线返回到储罐; 分支供应管线，其从所述循环管线分支以将处理液体供应到所述处理单元; 回收管线，其将处理单元中已经供给到所述基板的处理液体返回到所述储存罐; 连接循环管线和回收管线的分配管线; 以及设置在分配线上的截止阀，其在清洁回收管线时被打开。