Invention Application
US20150355551A1 SYSTEMS FOR REMOVING PHOTORESISTS AND METHODS OF REMOVING PHOTORESISTS USING THE SAME
审中-公开
用于去除光电子的系统和使用该光学元件去除光电的方法
- Patent Title: SYSTEMS FOR REMOVING PHOTORESISTS AND METHODS OF REMOVING PHOTORESISTS USING THE SAME
- Patent Title (中): 用于去除光电子的系统和使用该光学元件去除光电的方法
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Application No.: US14734106Application Date: 2015-06-09
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Publication No.: US20150355551A1Publication Date: 2015-12-10
- Inventor: Young-Ok KIM , Byoung-Moon YOON , Kyung-Hyun KIM , Yong-Sun KO
- Applicant: Samsung Electronics Co., Ltd.
- Priority: KR10-2014-0069482 20140609
- Main IPC: G03F7/42
- IPC: G03F7/42
Abstract:
A system for removing a photoresist includes a solution storage configured to store a preliminary photoresist removal solution, a solution activation unit configured to convert the preliminary photoresist removal solution from the solution storage into an activated photoresist removal solution, and a photoresist removal unit configured to receive the activated photoresist removal solution from the solution activation unit, and configured to load a substrate including a photoresist pattern formed thereon.
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