公开(公告)号：US20150355551A1

公开(公告)日：2015-12-10

申请号：US14734106

申请日：2015-06-09

Applicant: Samsung Electronics Co., Ltd.

Inventor： Young-Ok KIM ,  Byoung-Moon YOON ,  Kyung-Hyun KIM ,  Yong-Sun KO

IPC: G03F7/42

CPC classification number: G03F7/423

Abstract: A system for removing a photoresist includes a solution storage configured to store a preliminary photoresist removal solution, a solution activation unit configured to convert the preliminary photoresist removal solution from the solution storage into an activated photoresist removal solution, and a photoresist removal unit configured to receive the activated photoresist removal solution from the solution activation unit, and configured to load a substrate including a photoresist pattern formed thereon.

Abstract translation: 一种用于去除光致抗蚀剂的系统包括配置成存储初步光致抗蚀剂去除溶液的溶液储存器，配置成将来自溶液储存器的初步光致抗蚀剂去除溶液转化成活性光致抗蚀剂去除溶液的溶液激活单元，以及被配置为接收 来自溶液激活单元的活化的光致抗蚀剂去除溶液，并且被配置为加载包括其上形成的光致抗蚀剂图案的基板。