公开(公告)号：US20200303182A1

公开(公告)日：2020-09-24

申请号：US16892478

申请日：2020-06-04

Applicant: Samsung Electronics Co., Ltd.

Inventor： Won-Ho JANG ,  Jeong-Yong BAE ,  Woo-Young KIM ,  Hyun-Jung LEE ,  Se-Jin PARK ,  Yong-Sun KO ,  Dong-Gyun HAN ,  Woo-Gwan SHIM ,  Boong KIM

IPC: H01L21/02 ,  H01L21/67 ,  B08B7/00 ,  H01L21/687

Abstract: A substrate processing apparatus includes a chamber providing a space in which a substrate is processed, a first substrate support within the chamber and configured to support the substrate when the substrate is loaded into chamber, a second substrate support within the chamber and configured to support the substrate in a height greater than the height in which the first substrate supports the substrate, a first supply port through which a supercritical fluid is supplied to a first space under the substrate of a chamber space, a second supply port through which the supercritical fluid is supplied to a second space above the substrate of the chamber space, and an exhaust port through which the supercritical fluid is exhausted from the chamber.

公开(公告)号：US20190096712A1

公开(公告)日：2019-03-28

申请号：US15978303

申请日：2018-05-14

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sang-Jine PARK ,  Byung-Kwon CHO ,  Yong-Jhin CHO ,  Yong-Sun KO ,  Yeon-Jin GIL ,  Kwang-Wook LEE

IPC: H01L21/67 ,  H01L21/302 ,  H01L21/66

CPC classification number: H01L21/67092 ,  H01L21/302 ,  H01L21/6719 ,  H01L21/67253 ,  H01L22/12

Abstract: Disclosed are a supercritical process chamber and an apparatus having the same. The process chamber includes a body frame having a protrusion protruding in an upward vertical direction from a first surface of the body frame and a recess defined by the protrusion and the first surface of the body frame; a cover frame; a buffer chamber arranged between the body frame and the cover frame; and a connector. The buffer chamber includes an inner vessel detachably coupled to the body frame providing a chamber space in the recess and an inner cover detachably coupled to the cover frame. The inner cover is in contact with a first surface of the inner vessel enclosing the chamber space from surroundings. The connector couples the body frame and the cover frame having the buffer chamber arranged therebetween such that the enclosed chamber space is transformed into a process space in which the supercritical process is performed.

公开(公告)号：US20180267409A1

公开(公告)日：2018-09-20

申请号：US15986901

申请日：2018-05-23

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jung-Min OH ,  Mi-Hyun PARK ,  Hyo-San LEE ,  Ji-Hoon JEONG ,  Yong-Sun KO ,  In-Gi KIM ,  Na-Rim KIM ,  Sang-Tae KIM ,  Seong-Min KIM ,  Kyong-Ho LEE

IPC: G03F7/42 ,  H01L29/16 ,  H01L21/8238 ,  H01L21/311 ,  G03F7/039 ,  H01L21/266

CPC classification number: G03F7/426 ,  G03F7/039 ,  G03F7/42 ,  G03F7/422 ,  G03F7/425 ,  H01L21/266 ,  H01L21/31133 ,  H01L21/823814 ,  H01L21/823828 ,  H01L29/16

Abstract: A composition for removing photoresist, including an alkyl ammonium fluoride salt in an amount ranging from about 0.5 weight percent to about 10 weight percent, based on a total weight of the composition; an organic sulfonic acid in an amount ranging from about 1 weight percent to about 20 weight percent, based on the total weight of the composition; and a lactone-based solvent in an amount ranging from about 70 weight percent to about 98.5 weight percent, based on the total weight of the composition.

公开(公告)号：US20180190485A1

公开(公告)日：2018-07-05

申请号：US15826916

申请日：2017-11-30

Applicant: Samsung Electronics Co., Ltd

Inventor： Won-Ho JANG ,  Hyun-Jung LEE ,  Se-Jin PARK ,  Yong-Sun KO ,  Dong-Gyun HAN ,  Woo-Gwan SHIM ,  Jeong-Yong BAE ,  Woo-Young KIM ,  Boong KIM

IPC: H01L21/02 ,  H01L21/67 ,  B08B7/00

CPC classification number: H01L21/02101 ,  B08B3/08 ,  B08B7/0021 ,  B08B2203/007 ,  H01L21/67017 ,  H01L21/67034 ,  H01L21/67103 ,  H01L21/6719 ,  H01L21/67248 ,  H01L21/67253 ,  H01L21/68742 ,  H01L21/6875

Abstract: A substrate processing apparatus includes a chamber providing a space in which a substrate is processed, a first substrate support within the chamber and configured to support the substrate when the substrate is loaded into chamber, a second substrate support within the chamber and configured to support the substrate in a height greater than the height in which the first substrate supports the substrate, a first supply port through which a supercritical fluid is supplied to a first space under the substrate of a chamber space, a second supply port through which the supercritical fluid is supplied to a second space above the substrate of the chamber space, and an exhaust port through which the supercritical fluid is exhausted from the chamber.

公开(公告)号：US20150355551A1

公开(公告)日：2015-12-10

申请号：US14734106

申请日：2015-06-09

Applicant: Samsung Electronics Co., Ltd.

Inventor： Young-Ok KIM ,  Byoung-Moon YOON ,  Kyung-Hyun KIM ,  Yong-Sun KO

IPC: G03F7/42

CPC classification number: G03F7/423

Abstract: A system for removing a photoresist includes a solution storage configured to store a preliminary photoresist removal solution, a solution activation unit configured to convert the preliminary photoresist removal solution from the solution storage into an activated photoresist removal solution, and a photoresist removal unit configured to receive the activated photoresist removal solution from the solution activation unit, and configured to load a substrate including a photoresist pattern formed thereon.

Abstract translation: 一种用于去除光致抗蚀剂的系统包括配置成存储初步光致抗蚀剂去除溶液的溶液储存器，配置成将来自溶液储存器的初步光致抗蚀剂去除溶液转化成活性光致抗蚀剂去除溶液的溶液激活单元，以及被配置为接收 来自溶液激活单元的活化的光致抗蚀剂去除溶液，并且被配置为加载包括其上形成的光致抗蚀剂图案的基板。