发明申请
- 专利标题: EMITTER DIFFUSION CONDITIONS FOR BLACK SILICON
- 专利标题(中): 黑硅发射极扩散条件
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申请号: US14734256申请日: 2015-06-09
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公开(公告)号: US20150357506A1公开(公告)日: 2015-12-10
- 发明人: Wendy G. Ahearn , David Howard Levy , Richard W. Topel, JR. , Theodore Zubil
- 申请人: Wendy G. Ahearn , David Howard Levy , Richard W. Topel, JR. , Theodore Zubil
- 申请人地址: US NJ Red Bank
- 专利权人: Natcore Technology, Inc.
- 当前专利权人: Natcore Technology, Inc.
- 当前专利权人地址: US NJ Red Bank
- 主分类号: H01L31/18
- IPC分类号: H01L31/18
摘要:
In some cases, it is desirable to perform doping when manufacturing a solar cell to improve efficiency. Dopant diffusion may include the steps of: (a) an initial temperature ramp, (b) dopant vapor flow, (c) drive-in, and (d) cool down. However, doping may result in excessive doping, such as in regions where the solar cell has been nanoscale textured to provide black silicon, thereby creating a dead zone with excessive recombination of charge carriers. In the systems and method discussed herein, dopant vapor flow and drive-in steps may be performed at two different temperature set points to minimize or eliminate the formation of dead zones. In some embodiments, the dopant vapor flow may be performed at a lower temperature set point than the drive-in.
公开/授权文献
- US09324899B2 Emitter diffusion conditions for black silicon 公开/授权日:2016-04-26
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