发明申请
US20160001332A1 SUBSTRATE TREATING APPARATUS AND METHOD 审中-公开
基板处理装置和方法

SUBSTRATE TREATING APPARATUS AND METHOD
摘要:
The inventive concepts provide an apparatus for treating a substrate. The apparatus includes a housing proving an inner space in which a substrate is treated, a spin head supporting and rotating the substrate in the housing, an injection unit comprising a first nozzle member spraying a first treatment solution to the substrate put on the spin head, and a controller controlling the first nozzle member. The first nozzle member includes a body, a vibrator, a pump, and a power source.
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