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公开(公告)号:US20160001332A1
公开(公告)日:2016-01-07
申请号:US14747287
申请日:2015-06-23
申请人: Jong Han Kim , Yoon-Jong Ju , Yu Hwan Kim , Edwin Lee , Seong Soo Lee
发明人: Jong Han Kim , Yoon-Jong Ju , Yu Hwan Kim , Edwin Lee , Seong Soo Lee
CPC分类号: B08B3/02 , B05B13/0242 , B05B17/0646 , H01L21/67051
摘要: The inventive concepts provide an apparatus for treating a substrate. The apparatus includes a housing proving an inner space in which a substrate is treated, a spin head supporting and rotating the substrate in the housing, an injection unit comprising a first nozzle member spraying a first treatment solution to the substrate put on the spin head, and a controller controlling the first nozzle member. The first nozzle member includes a body, a vibrator, a pump, and a power source.
摘要翻译: 本发明的概念提供了一种用于处理基底的装置。 该装置包括:外壳,用于检测其中处理基板的内部空间;旋转头,其支撑并旋转基板在壳体中;旋转头,其包括将第一处理溶液喷射到放置在旋转头上的基底上的第一喷嘴构件; 以及控制所述第一喷嘴构件的控制器。 第一喷嘴构件包括主体,振动器,泵和电源。