Invention Application
- Patent Title: CALIBRATION OF PHOTOELECTROMAGNETIC SENSOR IN A LASER SOURCE
- Patent Title (中): 光电传感器在激光源中的校准
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Application No.: US14330526Application Date: 2014-07-14
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Publication No.: US20160011057A1Publication Date: 2016-01-14
- Inventor: Rong Liu , Robert J. Rafac , David Wayne Myers , Robert A. Bergstedt , Paul Alexander McKenzie
- Applicant: ASML Netherlands B.V.
- Main IPC: G01J11/00
- IPC: G01J11/00 ; G01J1/42 ; H05G2/00

Abstract:
In a laser-produced plasma (LPP) extreme ultraviolet (EUV) system, laser pulses are used to produce EUV light. To determine the energy of individual laser pulses, a photoelectromagnetic (PEM) detector is calibrated to a power meter using a calibration coefficient. When measuring a unitary laser beam comprising pulses of a single wavelength, the calibration coefficient is calculated based on a burst of the pulses. A combined laser beam has main pulses of a first wavelength alternating with pre-pulses pulses of a second wavelength. To calculate the energy of the main pulses in the combined laser beam, the calibration coefficient calculated for a unitary laser beam of the main pulses is used. To calculate the energy of the pre-pulses in the combined laser beam, a new calibration coefficient is calculated. When the calculated energy values drift beyond a pre-defined threshold, the calibration coefficients are recalculated.
Public/Granted literature
- US09239269B1 Calibration of photoelectromagnetic sensor in a laser source Public/Granted day:2016-01-19
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