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公开(公告)号：US09232624B2
公开(公告)日：2016-01-05
申请号：US14817408
申请日：2015-08-04
Applicant: ASML Netherlands B.V.
Inventor： Robert J. Rafac , Yezheng Tao
CPC classification number: H05G2/008 , G03F7/70033 , G21K5/00 , H05G2/005
Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.
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公开(公告)号：US20150342016A1
公开(公告)日：2015-11-26
申请号：US14817408
申请日：2015-08-04
Applicant: ASML Netherlands B.V.
Inventor： Robert J. Rafac , Yezheng Tao
CPC classification number: H05G2/008 , G03F7/70033 , G21K5/00 , H05G2/005
Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.
Abstract translation: 用于产生EUV光的技术包括将第一辐射脉冲引导到目标材料液滴以形成修改的液滴，所述第一辐射脉冲具有足以改变目标材料液滴形状的能量; 将第二脉冲的辐射引向修饰的液滴以形成吸收材料，第二脉冲的辐射具有足以改变改性液滴的性质的能量，该性质与辐射的吸收有关; 并且将放大的光束引向吸收材料，放大的光束具有足以将吸收材料的至少一部分转化成极紫外（EUV）光的能量。
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公开(公告)号：US09232623B2
公开(公告)日：2016-01-05
申请号：US14489411
申请日：2014-09-17
Applicant: ASML Netherlands B.V.
Inventor： Robert J. Rafac , Richard L. Sandstrom , Daniel Brown , Kai-Chung Hou
IPC: H05G2/00
CPC classification number: H05G2/008 , G03F7/70033 , G03F7/70058
Abstract: A target material is provided at a target location, the target material including a material that emits extreme ultraviolet light when converted to plasma, and the target material extending in a first extent along a first direction and in a second extent along a second direction; an amplified light beam is directed along a direction of propagation toward the target location; and the amplified light beam is focused in a focal plane, where the target location is outside of the focal plane and an interaction between the amplified light beam and the target material converts at least part of the target material to plasma that emits EUV light.
Abstract translation: 目标材料设置在目标位置，目标材料包括当转换成等离子体时发射极紫外光的材料，目标材料沿着第一方向沿第一方向延伸并且沿第二方向延伸到第二范围内; 放大的光束沿着传播方向被引向目标位置; 并且放大的光束聚焦在焦平面中，其中目标位置在焦平面之外，并且放大的光束和目标材料之间的相互作用将至少部分目标材料转换成发射EUV光的等离子体。
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公开(公告)号：US20150189729A1
公开(公告)日：2015-07-02
申请号：US14563186
申请日：2014-12-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Robert J. Rafac , Yezheng Tao
CPC classification number: H05G2/008 , G03F7/70033 , G21K5/00 , H05G2/005
Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.
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公开(公告)号：US08912514B2
公开(公告)日：2014-12-16
申请号：US14310972
申请日：2014-06-20
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J. W. Brown , Daniel J. Golich
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
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Patent Agency Ranking
公开(公告)号：US20140264087A1
公开(公告)日：2014-09-18
申请号：US13830461
申请日：2013-03-14
Applicant: ASML Netherlands B.V.
Inventor： Robert J. Rafac , Yezheng Tao
IPC: H05G2/00
CPC classification number: H05G2/008 , G03F7/70033 , G21K5/00 , H05G2/005
Abstract: Techniques for generating EUV light include directing a first pulse of radiation toward a target material droplet to form a modified droplet, the first pulse of radiation having an energy sufficient to alter a shape of the target material droplet; directing a second pulse of radiation toward the modified droplet to form an absorption material, the second pulse of radiation having an energy sufficient to change a property of the modified droplet, the property being related to absorption of radiation; and directing an amplified light beam toward the absorption material, the amplified light beam having an energy sufficient to convert at least a portion of the absorption material into extreme ultraviolet (EUV) light.
Abstract translation: 用于产生EUV光的技术包括将第一辐射脉冲引导到目标材料液滴以形成修改的液滴，所述第一辐射脉冲具有足以改变目标材料液滴形状的能量; 将第二脉冲的辐射引向修饰的液滴以形成吸收材料，第二脉冲的辐射具有足以改变改性液滴的性质的能量，该性质与辐射的吸收有关; 并且将放大的光束引向吸收材料，放大的光束具有足以将吸收材料的至少一部分转化成极紫外（EUV）光的能量。
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公开(公告)号：US09239268B1
公开(公告)日：2016-01-19
申请号：US14330488
申请日：2014-07-14
Applicant: ASML Netherlands B.V.
Inventor： Rong Liu , Robert J. Rafac , David Wayne Myers , Robert A. Bergstedt , Paul Alexander McKenzie
CPC classification number: G01J11/00 , G01J1/0228 , G01J1/0295 , G01J1/429 , G01J2001/4238 , G01J2001/4247 , H01S3/0014 , H01S3/2232 , H01S5/042 , H05G2/008
Abstract: In a laser-produced plasma (LPP) extreme ultraviolet (EUV) system, laser pulses are used to produce EUV light. To determine the energy of individual laser pulses, a photoelectromagnetic (PEM) detector is calibrated to a power meter using a calibration coefficient. When measuring a unitary laser beam comprising pulses of a single wavelength, the calibration coefficient is calculated based on a burst of the pulses. A combined laser beam has main pulses of a first wavelength alternating with pre-pulses pulses of a second wavelength. To calculate the energy of the main pulses in the combined laser beam, the calibration coefficient calculated for a unitary laser beam of the main pulses is used. To calculate the energy of the pre-pulses in the combined laser beam, a new calibration coefficient is calculated. When the calculated energy values drift beyond a pre-defined threshold, the calibration coefficients are recalculated.
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公开(公告)号：US20160011057A1
公开(公告)日：2016-01-14
申请号：US14330526
申请日：2014-07-14
Applicant: ASML Netherlands B.V.
Inventor： Rong Liu , Robert J. Rafac , David Wayne Myers , Robert A. Bergstedt , Paul Alexander McKenzie
CPC classification number: G01J11/00 , G01J1/0228 , G01J1/0295 , G01J1/4257 , G01J1/429 , G01J2001/4238 , G02B27/0025 , H01S5/042 , H05G2/008
Abstract: In a laser-produced plasma (LPP) extreme ultraviolet (EUV) system, laser pulses are used to produce EUV light. To determine the energy of individual laser pulses, a photoelectromagnetic (PEM) detector is calibrated to a power meter using a calibration coefficient. When measuring a unitary laser beam comprising pulses of a single wavelength, the calibration coefficient is calculated based on a burst of the pulses. A combined laser beam has main pulses of a first wavelength alternating with pre-pulses pulses of a second wavelength. To calculate the energy of the main pulses in the combined laser beam, the calibration coefficient calculated for a unitary laser beam of the main pulses is used. To calculate the energy of the pre-pulses in the combined laser beam, a new calibration coefficient is calculated. When the calculated energy values drift beyond a pre-defined threshold, the calibration coefficients are recalculated.
Abstract translation: 在激光产生的等离子体（LPP）极紫外（EUV）系统中，使用激光脉冲来产生EUV光。 为了确定单个激光脉冲的能量，使用校准系数将光电（PEM）检测器校准到功率计。 当测量包括单个波长的脉冲的单一激光束时，基于脉冲的脉冲串来计算校准系数。 组合的激光束具有与第二波长的预脉冲脉冲交替的第一波长的主脉冲。 为了计算组合激光束中主脉冲的能量，使用为主脉冲的单一激光束计算的校准系数。 为了计算组合激光束中预脉冲的能量，计算出新的校准系数。 当计算出的能量值漂移超过预先定义的阈值时，重新计算校准系数。
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公开(公告)号：US20160011056A1
公开(公告)日：2016-01-14
申请号：US14330488
申请日：2014-07-14
Applicant: ASML Netherlands B.V.
Inventor： Rong Liu , Robert J. Rafac , David Wayne Myers , Robert A. Bergstedt , Paul Alexander McKenzie
CPC classification number: G01J11/00 , G01J1/0228 , G01J1/0295 , G01J1/429 , G01J2001/4238 , G01J2001/4247 , H01S3/0014 , H01S3/2232 , H01S5/042 , H05G2/008
Abstract: In a laser-produced plasma (LPP) extreme ultraviolet (EUV) system, laser pulses are used to produce EUV light. To determine the energy of individual laser pulses, a photoelectromagnetic (PEM) detector is calibrated to a power meter using a calibration coefficient. When measuring a unitary laser beam comprising pulses of a single wavelength, the calibration coefficient is calculated based on a burst of the pulses. A combined laser beam has main pulses of a first wavelength alternating with pre-pulses pulses of a second wavelength. To calculate the energy of the main pulses in the combined laser beam, the calibration coefficient calculated for a unitary laser beam of the main pulses is used. To calculate the energy of the pre-pulses in the combined laser beam, a new calibration coefficient is calculated. When the calculated energy values drift beyond a pre-defined threshold, the calibration coefficients are recalculated.
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公开(公告)号：US09155179B2
公开(公告)日：2015-10-06
申请号：US14550421
申请日：2014-11-21
Applicant: ASML Netherlands B.V.
Inventor： Yezheng Tao , Robert J. Rafac , Igor V. Fomenkov , Daniel J. W. Brown , Daniel J. Golich
Abstract: Techniques for forming a target and for producing extreme ultraviolet light include releasing an initial target material toward a target location, the target material including a material that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first amplified light beam toward the initial target material, the first amplified light beam having an energy sufficient to form a collection of pieces of target material from the initial target material, each of the pieces being smaller than the initial target material and being spatially distributed throughout a hemisphere shaped volume; and directing a second amplified light beam toward the collection of pieces to convert the pieces of target material to plasma that emits EUV light.
Abstract translation: 用于形成靶和用于产生极紫外光的技术包括向目标位置释放初始目标材料，目标材料包括当转换成等离子体时发射极紫外（EUV）光的材料; 将第一放大光束引向初始目标材料，第一放大光束具有足以从初始目标材料形成目标材料的集合的能量，每个片段小于初始靶材料并且在空间上 分布在整个半球形体积上; 以及将第二放大光束引导到所述收集件，以将所述目标材料片转换成发射EUV光的等离子体。
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