发明申请
US20160023400A1 METHOD OF TRANSFERRING REVERSE PATTERN BY USING IMPRINT PROCESS
审中-公开
使用印刷工艺传输反向图案的方法
- 专利标题： METHOD OF TRANSFERRING REVERSE PATTERN BY USING IMPRINT PROCESS
- 专利标题（中）： 使用印刷工艺传输反向图案的方法
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申请号： US14733172申请日： 2015-06-08
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公开(公告)号： US20160023400A1公开(公告)日： 2016-01-28
- 发明人: Jaeseung Chung , Dongouk Kim , Joonyong Park , Jihyun Bae , Bongsu Shin , Jong G. Ok , Ilsun Yoon , Sunghoon Lee , Sukgyu Hahm
- 申请人： Samsung Electronics Co., Ltd.
- 优先权： KR10-2014-0095015 20140725
- 主分类号： B29C59/16
- IPC分类号： B29C59/16
摘要：
A method of transferring a reverse pattern using an imprint process includes: preparing a master mold, where a first pattern is defined on a surface of the master mold; coating an imprint resin on the master mold to cover the first pattern; pressing the imprint resin toward the master mold using a stamp member; curing the imprint resin to form a second pattern between the master mold and the stamp member, where the second pattern has a reverse shape to a shape of the first pattern; detaching the stamp member from the master mold to separate the second pattern from the master mold; and transferring the second pattern onto a transfer substrate.
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