发明申请
- 专利标题： LITHOGRAPHIC APPARATUS AND CONTAMINATION REMOVAL OR PREVENTION METHOD
- 专利标题（中）： 地平面设备和污染物去除或预防方法
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申请号： US14879852申请日： 2015-10-09
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公开(公告)号： US20160033875A1公开(公告)日： 2016-02-04
- 发明人: Anthonius Martinus Cornelis Petrus DE JONG , Hans JANSEN , Martinus Hendrikus Antonius LEENDERS , Antonius Johannus VAN DER NET , Peter Franciscus WANTEN , Jacques Cor Johan VAN DER DONCK , Robert Douglas WATSO , Teunis Cornelis VAN DEN DOOL , Nadja SCHUH , Jan Willem CROMWIJK
- 申请人： ASML NETHERLANDS B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03F7/20
- IPC分类号： G03F7/20
摘要：
An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
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