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公开(公告)号：US20230400785A1
公开(公告)日：2023-12-14
申请号：US18251261
申请日：2021-10-14
Applicant: ASML Netherlands B.V.
Inventor： Antonius Johannus VAN DER NET , Martinus Cornelis Maria VERHAGEN , Johannes Henricus Wilhelmus JACOBS , Laurentius Johannes Adrianus VAN BOKHOVEN , Jeroen Peterus Johannes VAN LIPZIG
IPC: G03F7/00
CPC classification number: G03F7/70891
Abstract: There is provided a conditioning system for a lithographic apparatus, said conditioning system being configured to condition one or more optical elements of the lithographic apparatus, wherein the conditioning system is configured to have a sub-atmospheric pressure at the one or more optical elements. Also provided are a lithographic apparatus comprising such a conditioning system, the use of such a conditioning system, a method of conditioning a system, as well as a lithographic method comprising a sub-atmospheric pressure cooling system
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公开(公告)号：US20150109593A1
公开(公告)日：2015-04-23
申请号：US14586518
申请日：2014-12-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Johannes Sophia Maria MERTENS , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Antonius Johannus VAN DER NET , Franciscus Johannes Herman Maria TEUNISSEN , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Edwin VAN GOMPEL
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
Abstract translation: 公开了一种光刻设备，其包括液体供应系统，该液体供应系统构造成至少部分地用液体填充投影系统和基板之间的空间，出口构造成去除通过液体和液体的液体限制结构之间的间隙的液体和气体的混合物， 液体供应系统和基材，以及构造成通过出口抽出混合物的抽空系统，排气系统具有分离器箱，其布置成将液体与混合物中的气体分离，分离器箱压力控制器连接到非液体 分离罐的填充区域，被构造成在非液体填充区域内保持稳定的压力。
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公开(公告)号：US20230367224A1
公开(公告)日：2023-11-16
申请号：US18225439
申请日：2023-07-24
Applicant: ASML Netherlands B.V.
Inventor： Hrishikesh PATEL , Yue MA , Günes MAKIBOGLU , Albert Pieter RIJPMA , Antonius Johannus VAN DER NET , Rens Henricus VERHEES , Zongquan YANG
CPC classification number: G03F7/70033 , G03F7/70916 , H05G2/005 , H05G2/008
Abstract: A radiation source includes a fuel supply, a collector, a debris mitigation system, and a temperature control system. The fuel supply device supplies fuel. The excitation device excites the fuel into a plasma. The collector collects radiation emitted by the plasma and directs the radiation to a beam exit. The debris mitigation system collects debris generated by the plasma and has a first component having a first conduit passing therethrough and a second component having a second conduit passing therethrough. The temperature control system increases or decreases temperatures of the first component and the second component by selectively heating or cooling a thermal transfer fluid circulating through the respective conduit. The temperature control system cools the first component to a first temperature that is below the melting point of the fuel and heats the second component to a second temperature that is above the melting point of the fuel.
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公开(公告)号：US20210063898A1
公开(公告)日：2021-03-04
申请号：US17098073
申请日：2020-11-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Erik Roelof LOOPSTRA , Aschwin Lodewijk Hendricus Johannes VAN MEER , Jeroen Johannes Sophia Maria MERTENS , Christianus Gerardus Maria DE MOL , Marcel Johannus Elisabeth Hubertus MUITJENS , Antonius Johannus VAN DER NET , Joost Jeroen OTTENS , Johannes Anna QUAEDACKERS , Maria Elisabeth REUHMAN-HUISKEN , Marco Koert STAVENGA , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Frederik Eduard DE JONG , Koen GOORMAN , Boris MENCHTCHIKOV , Herman BOOM , Stoyan NIHTIANOV , Richard MOERMAN , Martin Frans Pierre SMEETS , Bart Leonard Peter SCHOONDERMARK , Franciscus Johannes Joseph JANSSEN , Michel RIEPEN
IPC: G03F7/20
Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
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公开(公告)号：US20190235397A1
公开(公告)日：2019-08-01
申请号：US16376535
申请日：2019-04-05
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Erik Roelof LOOPSTRA , Aschwin Lodewijk Hendricus Johannes VAN MEER , Jeroen Johannes Sophia Maria MERTENS , Christianus Gerardus Maria DE MOL , Marcel Johannus Elisabeth Hubertus MUITJENS , Antonius Johannus VAN DER NET , Joost Jeroen OTTENS , Johannes Anna QUAEDACKERS , Maria Elisabeth REUHMAN-HUISKEN , Marco Koert STAVENGA , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Frederik Eduard DE JONG , Koen GOORMAN , Boris MENCHTCHIKOV , Herman BOOM , Stoyan NIHTIANOV , Richard MOERMAN , Martin Frans Pierre SMEETS , Bart Leonard Peter SCHOONDERMARK , Franciscus Johannes Joseph JANSSEN , Michel RIEPEN
IPC: G03F7/20
CPC classification number: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
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Patent Agency Ranking
公开(公告)号：US20160033875A1
公开(公告)日：2016-02-04
申请号：US14879852
申请日：2015-10-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Anthonius Martinus Cornelis Petrus DE JONG , Hans JANSEN , Martinus Hendrikus Antonius LEENDERS , Antonius Johannus VAN DER NET , Peter Franciscus WANTEN , Jacques Cor Johan VAN DER DONCK , Robert Douglas WATSO , Teunis Cornelis VAN DEN DOOL , Nadja SCHUH , Jan Willem CROMWIJK
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70925
Abstract: An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d).
Abstract translation: 或（c）过氧化氢和臭氧的混合物，或（b）浓度高达5％的过氧化氢，或（c） 浓度高达50ppm的臭氧，或（d）浓度高达10ppm的氧，或（e）选自（a） - （d）的任何组合。
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7.发明公开公开(公告)号：US20240176255A1
公开(公告)日：2024-05-30
申请号：US18284608
申请日：2022-03-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Remco VAN DE MEERENDONK , Daniel Jozef, Maria DIRECKS , Günes NAKÍBOGLU , Nicholas Peter WATERSON , Joost André KLUGKIST , Sven PEKELDER , Antonius Johannus VAN DER NET , Johannes Henricus Wilhelmus JACOBS , Jaap OUDES , Gerardus Arnoldus Hendricus, Franciscus JANSSEN , Jeroen, Peterus Johannes VAN LIPZIG , Johannes, Franciscus Martinus VAN SANTVOORT
IPC: G03F7/00
CPC classification number: G03F7/70891
Abstract: A temperature conditioning system using conditioning liquid to condition a temperature of an object, the system including a conditioning conduit, a return conduit, a supply chamber, and a discharge chamber, wherein the temperature conditioning system is arranged to provide a static pressure difference between the supply chamber outlet and the discharge chamber inlet to create a flow through the conditioning conduit. A lithography apparatus and a method of temperature conditioning an object is also described.
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公开(公告)号：US20180039188A1
公开(公告)日：2018-02-08
申请号：US15694537
申请日：2017-09-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Johannes Sophia Maria MERTENS , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Antonius Johannus VAN DER NET , Franciscus Johannes Herman Maria TEUNISSEN , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Edwin Augustinus Matheus VAN GOMPEL
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
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公开(公告)号：US20160370714A1
公开(公告)日：2016-12-22
申请号：US15251915
申请日：2016-08-30
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Johannes Sophia Maria MERTENS , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Antonius Johannus VAN DER NET , Franciscus Johannes Herman Maria TEUNISSEN , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPAY , Edwin Augustinus Matheus VAN GOMPEL
IPC: G03F7/20
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
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10.发明申请公开(公告)号：US20160048085A1
公开(公告)日：2016-02-18
申请号：US14882241
申请日：2015-10-13
Applicant: ASML NETHERLANDS B.V.
Inventor： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus JACOBS , Nicolaas TEN KATE , Erik Roelof LOOPSTRA , Aschwin Lodewijk Hendricus Johannes VERMEER , Jeroen Johannes Sophia Maria MERTENS , Christianus Gerardus Maria DE MOL , Marcel Johannus Elisabeth Hubertus MUITJENS , Antonius Johannus VAN DER NET , Joost Jeroen OTTENS , Johannes Anna QUAEDACKERS , Maria Elisabeth REUHMAN-HUISKEN , Marco Koert STAVENGA , Patricius Aloysius Jacobus TINNEMANS , Martinus Cornelis Maria VERHAGEN , Jacobus Johannus Leonardus Hendricus VERSPA Y , Frederik Eduard DE JONG , Koen GOORMAN , Boris MENCHTCHIKOV , Herman BOOM , Stoyan NIHTIANOV , Richard MOERMAN , Martin Frans Pierre SMEETS , Bart Leonard Peter SCHOONDERMARK , Franciscus Johannes Joseph JANSSEN , Michel RIEPEN
IPC: G03F7/20
CPC classification number: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
Abstract translation: 描述了一种光刻设备，其具有液体供应系统，其被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件和加热器。
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