Invention Application
- Patent Title: MAGNETRON ASSEMBLY FOR PHYSICAL VAPOR DEPOSITION CHAMBER
- Patent Title (中): 用于物理蒸气沉积室的MAGNETRON装配
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Application No.: US14725527Application Date: 2015-05-29
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Publication No.: US20160035547A1Publication Date: 2016-02-04
- Inventor: WILLIAM JOHANSON , BRIJ DATTA , FUHONG ZHANG , ADOLPH MILLER ALLEN , YU Y. LIU , PRASHANTH KOTHNUR
- Applicant: APPLIED MATERIALS, INC.
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C23C14/35

Abstract:
Methods and apparatus for a magnetron assembly are provided herein. In some embodiments, a magnetron assembly includes a shunt plate having a central axis and rotatable about the central axis, a closed loop magnetic pole coupled to a first surface of the shunt plate and disposed 360 degrees along a peripheral edge of the shunt plate, and an open loop magnetic pole coupled at a the first surface of the shunt plate wherein the open loop magnetic pole comprises two rows of magnets disposed about the central axis.
Public/Granted literature
- US09991101B2 Magnetron assembly for physical vapor deposition chamber Public/Granted day:2018-06-05
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