Invention Application
US20160035845A1 Vertical Semiconductor Device having Semiconductor Mesas with Side Walls and a PN-Junction Extending between the Side Walls 有权
具有具有侧壁的半导体介面和在侧壁之间延伸的PN结的垂直半导体器件

  • Patent Title: Vertical Semiconductor Device having Semiconductor Mesas with Side Walls and a PN-Junction Extending between the Side Walls
  • Patent Title (中): 具有具有侧壁的半导体介面和在侧壁之间延伸的PN结的垂直半导体器件
  • Application No.: US14879851
    Application Date: 2015-10-09
  • Publication No.: US20160035845A1
    Publication Date: 2016-02-04
  • Inventor: Peter BrandlMatthias Herman Peri
  • Applicant: Infineon Technologies AG
  • Main IPC: H01L29/423
  • IPC: H01L29/423 H01L29/78
Vertical Semiconductor Device having Semiconductor Mesas with Side Walls and a PN-Junction Extending between the Side Walls
Abstract:
A vertical semiconductor device includes a semiconductor body having a backside and extending, in a peripheral area and in a vertical direction substantially perpendicular to the backside, from the backside to a first surface of the semiconductor body, the body including in an active area spaced apart semiconductor mesas extending, in the vertical direction, from the first surface to a main surface arranged above the first surface, in a vertical cross-section the peripheral area extending between the active area and an edge that extends between the back-side and the first surface, in the vertical cross-section each of the mesas including first and second side walls, a first pn-junction extending between the first and second side walls, and a conductive region in Ohmic contact with the mesa and extending from the main surface into the mesa. Gate electrodes are arranged between adjacent mesas and extend across the first pn-junctions.
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