Invention Application
US20160041064A1 Aberration Computing Device, Aberration Computing Method, Image Processor, Image Processing Method, and Electron Microscope
审中-公开
畸变计算设备，畸变计算方法，图像处理器，图像处理方法和电子显微镜
- Patent Title: Aberration Computing Device, Aberration Computing Method, Image Processor, Image Processing Method, and Electron Microscope
- Patent Title (中): 畸变计算设备，畸变计算方法，图像处理器，图像处理方法和电子显微镜
-
Application No.: US14706308Application Date: 2015-05-07
-
Publication No.: US20160041064A1Publication Date: 2016-02-11
- Inventor: Shigeyuki Morishita
- Applicant: JEOL Ltd.
- Priority: JP2014-96832 20140508
- Main IPC: G01M11/02
- IPC: G01M11/02 ; H01J37/26
Abstract:
An aberration computing device (100) includes a fitting section (48) for fitting line profiles of a diffractogram taken in radial directions to a fitting function and finding fitting parameters of the fitting function and a computing section (49) for finding at least one of an amount of defocus and two-fold astigmatism, based on the fitting parameters.
Public/Granted literature
Information query
