Invention Application
- Patent Title: MASK PLATE AND PROCESSES FOR MANUFACTURING ULTRAVIOLET MASK PLATE AND ARRAY SUBSTRATE
- Patent Title (中): 掩模板和制造超薄膜掩模板和阵列基板的方法
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Application No.: US14416784Application Date: 2014-06-26
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Publication No.: US20160041417A1Publication Date: 2016-02-11
- Inventor: Xiangyang XU
- Applicant: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- International Application: PCT/CN2014/080822 WO 20140626
- Main IPC: G02F1/1343
- IPC: G02F1/1343 ; H01L21/283 ; G02F1/1362 ; G03F1/50 ; G03F1/76 ; G03F1/80 ; H01L21/3213 ; H01L21/28
Abstract:
The present disclosure discloses a mask plate and processes for manufacturing an ultraviolet mask plate and an array substrate. The present disclosure relates to the field of display technology and can reduce costs for manufacturing ultraviolent mask plates. The mask plate comprises a transparent area, a semi-transparent area, and a non-transparent area, wherein the transparent area and the non-transparent area correspond to a frame glue area and a layer pattern area of a liquid crystal display panel, respectively, and other regions of the mask plate constitute said semi-transparent area. The present disclosure can be used in the manufacture of display devices of liquid crystal display televisions, liquid crystal displays, mobile phones, tablet computers, etc.
Public/Granted literature
- US09329445B2 Mask plate and processes for manufacturing ultraviolet mask plate and array substrate Public/Granted day:2016-05-03
Information query
IPC分类:
