Invention Application
US20160070172A1 COMPOSITIONS COMPRISING SULFONAMIDE MATERIAL AND PROCESSES FOR PHOTOLITHOGRAPHY
审中-公开
包含磺酰胺材料的组合物和用于光刻胶的方法
- Patent Title: COMPOSITIONS COMPRISING SULFONAMIDE MATERIAL AND PROCESSES FOR PHOTOLITHOGRAPHY
- Patent Title (中): 包含磺酰胺材料的组合物和用于光刻胶的方法
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Application No.: US14685290Application Date: 2015-04-13
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Publication No.: US20160070172A1Publication Date: 2016-03-10
- Inventor: Deyan Wang , Chunyi Wu , George G. Barclay , Cheng-Bai Xu
- Applicant: Rohm and Haas Electronic Materials, LLC
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/039
Abstract:
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sulfonamide substitution. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
Public/Granted literature
- US10558122B2 Compositions comprising sulfonamide material and processes for photolithography Public/Granted day:2020-02-11
Information query
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