Invention Application
- Patent Title: FILM FORMING METHOD AND FILM FORMING APPARATUS
- Patent Title (中): 薄膜成型方法和薄膜成型装置
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Application No.: US14844193Application Date: 2015-09-03
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Publication No.: US20160071728A1Publication Date: 2016-03-10
- Inventor: Satoshi TAKAGI , Kazuya TAKAHASHI , Hiroki MURAKAMI , Daisuke SUZUKI
- Applicant: TOKYO ELECTRON LIMITED
- Priority: JP2014-181416 20140905
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C23C16/44 ; C23C16/52 ; C30B29/52 ; C30B1/04 ; C30B29/06 ; C30B29/08 ; C23C16/455 ; C30B1/02
Abstract:
There is provided a method of forming a film on a surface to be processed of a workpiece, the method including: accommodating the workpiece with a single-crystallized substance formed on the surface to be processed, into a processing chamber; supplying a crystallization suppressing process gas into the processing chamber such that a crystallization of the single-crystallized substance formed on the surface to be processed is suppressed; and supplying a source gas into the processing chamber to form an amorphous film on the surface to be processed of the workpiece.
Public/Granted literature
- US09966256B2 Film forming method and film forming apparatus Public/Granted day:2018-05-08
Information query
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