Invention Application
- Patent Title: Plasma Processing Devices Having a Surface Protection Layer
- Patent Title (中): 具有表面保护层的等离子体处理装置
-
Application No.: US14794383Application Date: 2015-07-08
-
Publication No.: US20160079040A1Publication Date: 2016-03-17
- Inventor: MyoungSoo Park , Hakyoung Kim , Yumi Sung , Seungkyu Lim
- Applicant: Samsung Electronics Co., Ltd.
- Priority: KR10-2014-0120478 20140911
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01L21/67
Abstract:
Plasma processing devices may include a process chamber body, a substrate support unit in a lower portion of the process chamber body, and a window part in an upper portion of the process chamber body. The window part may include a base layer and a surface protection layer on the base layer and configured to face the substrate support unit. The surface protection layer may include an oxide having a columnar structure.
Information query
