Invention Application
- Patent Title: CIRCUITRY FOR BIASING LIGHT SHIELDING STRUCTURES AND DEEP TRENCH ISOLATION STRUCTURES
- Patent Title (中): 偏光屏蔽结构和深层隔离结构的电路
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Application No.: US14518862Application Date: 2014-10-20
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Publication No.: US20160111463A1Publication Date: 2016-04-21
- Inventor: Swarnal Borthakur , Marc Sulfridge
- Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Applicant Address: US AZ Phoenix
- Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Current Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Current Assignee Address: US AZ Phoenix
- Main IPC: H01L27/146
- IPC: H01L27/146 ; H04N5/238 ; H04N5/235 ; H04N5/335 ; H04N5/369

Abstract:
An imaging system may include an image sensor die stacked on top of a digital signal processor (DSP) die. Through-oxide vias (TOVs) may be formed in the image sensor die and may extend at least partially into in the DSP die to facilitate communications between the image sensor die and the DSP die. The image sensor die may include light shielding structures for preventing reference photodiodes in the image sensor die from receiving light and in-pixel grid structures for preventing cross-talk between adjacent pixels. The light shielding structure may receive a desired biasing voltage through a corresponding TOV, an integral plug structure, and/or a connection that makes contact directly with a polysilicon gate. The in-pixel grid may have a peripheral contact that receives the desired biasing voltage through a light shield, a conductive strap, a TOV, and/or an aluminum pad.
Public/Granted literature
- US09515111B2 Circuitry for biasing light shielding structures and deep trench isolation structures Public/Granted day:2016-12-06
Information query
IPC分类: