Invention Application
US20160116847A1 MASKLESS EXPOSURE DEVICE, MASKLESS EXPOSURE METHOD AND DISPLAY SUBSTRATE MANUFACTURED BY THE MASKLESS EXPOSURE DEVICE AND THE MASKLESS EXPOSURE METHOD
有权
无障碍曝光装置，由MASKING曝光装置制造的无障碍曝光方法和显示基板以及MASKLESS曝光方法
- Patent Title: MASKLESS EXPOSURE DEVICE, MASKLESS EXPOSURE METHOD AND DISPLAY SUBSTRATE MANUFACTURED BY THE MASKLESS EXPOSURE DEVICE AND THE MASKLESS EXPOSURE METHOD
- Patent Title (中): 无障碍曝光装置，由MASKING曝光装置制造的无障碍曝光方法和显示基板以及MASKLESS曝光方法
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Application No.: US14745366Application Date: 2015-06-19
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Publication No.: US20160116847A1Publication Date: 2016-04-28
- Inventor: Hyun-Seok Kim , Sang-Hyun Yun , Hi-Kuk Lee , Jae-Hyuk Chang , Sang-Hyun Lee , Jung-In Park , Jung-Chul Heo , Kab-Jong Seo , Ki-Beom Lee , Jun-Ho Sim
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Priority: KR10-2014-0145417 20141024
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.
Public/Granted literature
Information query
IPC分类:
