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公开(公告)号：US09594307B2
公开(公告)日：2017-03-14
申请号：US14226621
申请日：2014-03-26
发明人： Cha-Dong Kim , Hoon Kang , Chang-Hoon Kim , Sang-Hyun Yun , Jung-In Park , Woo-Yong Sung , Ki-Beom Lee , Hi-Kuk Lee , Jae-Hyuk Chang
CPC分类号： G03F7/70291 , G03F7/70508 , G03F7/7055
摘要： An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.
摘要翻译： 曝光装置包括光源，照明构件，突出构件，台，检查构件和信息处理构件。 光源被配置为根据表示光辐射周期的脉冲事件生成（PEG）提供光。 照明构件被配置为将光改变为点光。 突出构件被配置为根据在各个方向上延伸的光致抗蚀剂形状来投射点光源。 点灯投射在舞台上。 检查构件被配置为检查由投影点光形成的光致抗蚀剂图案。 信息处理构件被配置为分析对应于不同PEG的不同光刻胶图案，以从不同的PEG中选择一个PEG。 一个PEG与各个方向上的最小误差相关联。
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2.发明申请DIGITAL EXPOSURE DEVICE USING DIGITAL MICRO-MIRROR DEVICE AND A METHOD FOR CONTROLLING THE SAME 有权使用数字微镜装置的数字曝光装置及其控制方法公开(公告)号：US20150015859A1
公开(公告)日：2015-01-15
申请号：US14141147
申请日：2013-12-26
发明人： Sanghyun Yun , Cha-Dong Kim , Changhoon Kim , Jung-In Park , Kibeom Lee , Hikuk Lee , Jaehyuk Chang
IPC分类号： G03F7/20
CPC分类号： G03F7/70291 , G03F7/2051 , G03F7/70208 , G03F7/70275 , G03F7/70458
摘要： Provided is a digital exposure device. The digital exposure device includes a stage mounted with a substrate on which a pattern is formed, a first light source, a first head, and a digital micro-mirror device control unit. The stage is configured to move in a scan direction. The first light source is configured to provide a first light. The first head is spaced apart from the stage in a first direction and is configured to receive the first light, to generate at least one spot beam by modulating the first light, and to project the at least one spot beam onto the substrate. The digital micro-mirror device control unit is configured to control an energy of the at least one spot beam generated from the first head to be inversely proportional to a size of the at least spot beam generated from the first head.
摘要翻译： 提供了一种数字曝光装置。 数字曝光装置包括安装有其上形成有图案的基板的台，第一光源，第一头和数字微镜装置控制单元。 舞台被配置为沿扫描方向移动。 第一光源被配置为提供第一光。 第一头部在第一方向上与舞台间隔开，并且被配置为接收第一光，通过调制第一光以产生至少一个点光束，并将至少一个光束投射到衬底上。 数字微镜装置控制单元被配置为控制从第一头产生的至少一个点束的能量与从第一头产生的至少点光束的尺寸成反比。
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3.发明申请公开(公告)号：US20140167298A1
公开(公告)日：2014-06-19
申请号：US13871732
申请日：2013-04-26
发明人： Jae Hyuk CHANG , Hi Kuk Lee , Cha-Dong Kim , Sang Hyun Yun , Jung-In Park , Chang Hoon Kim , Kim Beom Lee
IPC分类号： G02F1/13 , G02F1/1339 , G02F1/1341 , G01B11/14
CPC分类号： G02F1/1341 , G01B11/272 , G02F1/1303 , G02F2001/133354 , G02F2001/133548
摘要： Exemplary embodiments of the invention relate to an alignment apparatus including a source unit providing an electromagnetic signal, a receiving unit detecting the provided electromagnetic signal, and a polarization element positioned between the source unit and the receiving unit and having a transmissive axis fixed in a predetermined direction. A substrate may be positioned between the source unit and the receiving unit, and may be formed with a polarizer including a plurality of metal lines with a minute linear pattern. The luminance or intensity of the electromagnetic signal may be detected by the receiving unit while rotating the substrate.
摘要翻译： 本发明的示例性实施例涉及一种对准装置，包括提供电磁信号的源单元，检测所提供的电磁信号的接收单元和位于源单元和接收单元之间的偏振元件，并且具有固定在预定的 方向。 衬底可以位于源单元和接收单元之间，并且可以由具有微小线性图案的多个金属线的偏振器形成。 在旋转基板的同时，可以由接收单元检测电磁信号的亮度或强度。
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公开(公告)号：US09645450B2
公开(公告)日：2017-05-09
申请号：US13871732
申请日：2013-04-26
发明人： Jae Hyuk Chang , Hi Kuk Lee , Cha-Dong Kim , Sang Hyun Yun , Jung-In Park , Chang Hoon Kim , Ki Beom Lee
IPC分类号： G01B11/00 , G02F1/1341 , G02F1/13 , G01B11/27 , G02F1/1333 , G02F1/1335
CPC分类号： G02F1/1341 , G01B11/272 , G02F1/1303 , G02F2001/133354 , G02F2001/133548
摘要： Exemplary embodiments of the invention relate to an alignment apparatus including a source unit providing an electromagnetic signal, a receiving unit detecting the provided electromagnetic signal, and a polarization element positioned between the source unit and the receiving unit and having a transmissive axis fixed in a predetermined direction. A substrate may be positioned between the source unit and the receiving unit, and may be formed with a polarizer including a plurality of metal lines with a minute linear pattern. The luminance or intensity of the electromagnetic signal may be detected by the receiving unit while rotating the substrate.
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5.发明授权Digital exposure device using digital micro-mirror device and a method for controlling the same 有权使用数字微镜装置的数字曝光装置及其控制方法公开(公告)号：US09310697B2
公开(公告)日：2016-04-12
申请号：US14141147
申请日：2013-12-26
发明人： Sanghyun Yun , Cha-Dong Kim , Changhoon Kim , Jung-In Park , Kibeom Lee , Hikuk Lee , Jaehyuk Chang
CPC分类号： G03F7/70291 , G03F7/2051 , G03F7/70208 , G03F7/70275 , G03F7/70458
摘要： Provided is a digital exposure device. The digital exposure device includes a stage mounted with a substrate on which a pattern is formed, a first light source, a first head, and a digital micro-mirror device control unit. The stage is configured to move in a scan direction. The first light source is configured to provide a first light. The first head is spaced apart from the stage in a first direction and is configured to receive the first light, to generate at least one spot beam by modulating the first light, and to project the at least one spot beam onto the substrate. The digital micro-mirror device control unit is configured to control an energy of the at least one spot beam generated from the first head to be inversely proportional to a size of the at least spot beam generated from the first head.
摘要翻译： 提供了一种数字曝光装置。 数字曝光装置包括安装有其上形成有图案的基板的台，第一光源，第一头和数字微镜装置控制单元。 舞台被配置为沿扫描方向移动。 第一光源被配置为提供第一光。 第一头部在第一方向上与舞台间隔开，并且被配置为接收第一光，通过调制第一光以产生至少一个点光束，并将至少一个光束投射到衬底上。 数字微镜装置控制单元被配置为控制从第一头产生的至少一个点束的能量与从第一头产生的至少点光束的尺寸成反比。
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6.发明授权公开(公告)号：US09921488B2
公开(公告)日：2018-03-20
申请号：US14612648
申请日：2015-02-03
发明人： Jun-Ho Sim , Jung-In Park , Ki-Beom Lee , Hi-Kuk Lee , Hyun-Seok Kim , Kab-Jong Seo , Sang-Hyun Yun , Sang-Hyun Lee , Jung-Chul Heo , Jong-Joo Kim , Chang-Hoon Kim
CPC分类号： G03F7/70641 , G02B26/0833 , G03F7/2053 , G03F7/70291 , G03F7/70383 , G03F7/70391
摘要： A maskless exposure device includes a stage on which a substrate is disposed, an optical head, and an optical source part. The optical head irradiates light to the substrate. The light source part provides the optical head with a light. The optical head irradiates the light, according to an average-focus distance, to the substrate. The average-focus distance is determined by averaging best-focus distances for a plurality of regions of the substrate, respectively.
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7.发明申请MASKLESS EXPOSURE DEVICE, MASKLESS EXPOSURE METHOD AND DISPLAY SUBSTRATE MANUFACTURED BY THE MASKLESS EXPOSURE DEVICE AND THE MASKLESS EXPOSURE METHOD 有权无障碍曝光装置，由MASKING曝光装置制造的无障碍曝光方法和显示基板以及MASKLESS曝光方法公开(公告)号：US20160054660A1
公开(公告)日：2016-02-25
申请号：US14664770
申请日：2015-03-20
发明人： Sang-Hyun Lee , Hyun-Seok Kim , Jung-Chul Heo , Hi-Kuk Lee , Sang-Hyun Yun , Ki-Beom Lee , Chang-Hoon Kim , Jung-In Park , Kab-Jong Seo , Jun-Ho Sim , Jae-Hyuk Chang
IPC分类号： G03F7/20 , H01L27/12 , H01L29/786
CPC分类号： G03F7/70291 , G03F7/70508 , H01L27/124 , H01L27/1285 , H01L29/41733 , H01L29/78696
摘要： A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.
摘要翻译： 无掩模曝光装置包括具有数字微镜装置的曝光头，数字微镜装置被配置为通过反射来自曝光源的源光束将曝光光束扫描到衬底; 以及系统控制部，被配置为通过利用图形数据系统文件来控制数字微镜装置。 图形数据系统文件在平面图中包括源电极，漏电极和源极和漏电极之间的沟道部分的数据。 通道部分包括沿垂直于曝光头的扫描方向的方向延伸的第一部分。 通道部分的第一部分的宽度被定义为曝光光束的脉冲事件产生的倍数。
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公开(公告)号：US09746780B2
公开(公告)日：2017-08-29
申请号：US14745366
申请日：2015-06-19
发明人： Hyun-Seok Kim , Sang-Hyun Yun , Hi-Kuk Lee , Jae-Hyuk Chang , Sang-Hyun Lee , Jung-In Park , Jung-Chul Heo , Kab-Jong Seo , Ki-Beom Lee , Jun-Ho Sim
CPC分类号： G03F7/70291 , G03F7/70358 , G03F7/70508
摘要： A maskless exposure device includes an exposure head including a digital micro-mirror device and an exposure source, the digital micro-mirror device being configured to reflect a source beam outputted from the exposure source to a substrate and a system controller configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data regarding patterns to be formed on the substrate. A pattern extending in a direction parallel to a scan direction of the exposure head includes a first pattern portion having a first width that is greater than a target width and a second pattern portion alternately disposed with the first pattern portion and having a second width that is less than the target width.
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公开(公告)号：US09690204B2
公开(公告)日：2017-06-27
申请号：US14664770
申请日：2015-03-20
发明人： Sang-Hyun Lee , Hyun-Seok Kim , Jung-Chul Heo , Hi-Kuk Lee , Sang-Hyun Yun , Ki-Beom Lee , Chang-Hoon Kim , Jung-In Park , Kab-Jong Seo , Jun-Ho Sim , Jae-Hyuk Chang
IPC分类号： G03B27/44 , G03B27/68 , G03F7/20 , H01L29/786 , H01L27/12 , H01L29/417
CPC分类号： G03F7/70291 , G03F7/70508 , H01L27/124 , H01L27/1285 , H01L29/41733 , H01L29/78696
摘要： A maskless exposure device includes an exposure head including a digital micro-mirror device, the digital micro-mirror device being configured to scan an exposure beam to a substrate by reflecting a source beam from an exposure source; and a system control part configured to control the digital micro-mirror device by utilizing a graphic data system file. The graphic data system file includes data for a source electrode, a drain electrode and a channel portion between the source electrode and the drain electrode in a plan view. The channel portion includes a first portion extending in a direction perpendicular to a scan direction of the exposure head. A width of the first portion of the channel portion is defined to be a multiple of a pulse event generation of the exposure beam.
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10.发明授权Maskless exposure device, maskless exposure method and display substrate manufactured by the maskless exposure device and the maskless exposure method 有权无掩模曝光装置，无掩模曝光方法和由无掩模曝光装置制造的显示基板和无掩模曝光方法公开(公告)号：US09436098B2
公开(公告)日：2016-09-06
申请号：US14635339
申请日：2015-03-02
发明人： Jung-Chul Heo , Hi-Kuk Lee , Jae-Hyuk Chang , Sang-Hyun Lee , Jung-In Park , Sang-Hyun Yun , Ki-Beom Lee , Hyun-Seok Kim , Kab-Jong Seo , Jun-Ho Sim , Byoung-Min Yun , Sang-Don Jang , Jae-Young Jang , Chang-Hoon Kim
IPC分类号： G03F7/20 , H01L29/786 , H01L27/12
CPC分类号： G03F7/70508 , G03F7/2022 , G03F7/2051 , G03F7/702 , G03F7/70291 , G03F7/70391 , H01L27/1222 , H01L27/124 , H01L27/1259 , H01L29/78669 , H01L29/78693 , H01L29/78696
摘要： A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head.
摘要翻译： 无掩模曝光装置包括具有数字微镜装置的曝光头。 数字微镜装置被配置为将从曝光源施加的源光束传输到衬底。 系统控制部分被配置为通过使用图形数据系统文件来控制数字微镜装置。 图形数据系统文件包括用于形成源电极，漏电极和设置在源电极和漏电极之间的沟道部分的数据。 图形系统文件包括用于形成相对于曝光头的扫描方向沿对角线方向延伸的通道部分的数据。
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