Invention Application
- Patent Title: Inkjet discharge method, pattern formation method, and pattern
- Patent Title (中): 喷墨放电法,图案形成方法和图案
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Application No.: US14757424Application Date: 2015-12-23
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Publication No.: US20160122563A1Publication Date: 2016-05-05
- Inventor: Yuichiro Goto , Tadashi Oomatsu , Hirotaka Kitagawa , Yuichiro Enomoto , Kenichi Kodama
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2013-134401 20130627
- Main IPC: C09D11/30
- IPC: C09D11/30 ; B41J2/01 ; C09D11/106

Abstract:
The present invention provides a discharge method which makes it possible to appropriately perform discharge even when a head for discharging microdroplets having a size of equal to or less than 6 pL that is necessary for controlling a residual film (forming a thin film and achieving uniformity) is used, and makes it possible to obtain an excellent pattern having excellent release properties. The discharge method is an inkjet discharge method including discharging a photocurable composition in the form of liquid droplets having a size of equal to or less than 6 pL, in which the composition satisfies the following (a) to (c), (a) containing a fluorine-containing material in a proportion of equal to or less than 4% by mass of the composition; (b) having a surface tension of 25 mN/m to 35 mN/m; and (c) containing a solvent having a boiling point of equal to or less than 200° C. in an amount of 5% by mass of the composition.
Public/Granted literature
- US09862847B2 Inkjet discharge method, pattern formation method, and pattern Public/Granted day:2018-01-09
Information query
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