Invention Application
- Patent Title: OPTICAL PROJECTION ARRAY EXPOSURE SYSTEM
- Patent Title (中): 光学投影阵列曝光系统
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Application No.: US14993071Application Date: 2016-01-11
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Publication No.: US20160124316A1Publication Date: 2016-05-05
- Inventor: David MARKLE , Thomas LAIDIG , Jeffrey KASKEY , Jang Fung CHEN
- Applicant: Applied Materials, Inc.
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A spatial light modulator imaging system is disclosed. The system comprises an illumination module configured to provide illumination light representing data patterns to be imaged by the spatial light modulator imaging system, a projection module configured to project the illumination light to a substrate, and an illumination-projection beam separator coupled between the illumination module and the projection module, where the illumination-projection beam separator is configured to receive the illumination light along an illumination optical axis and transmit the illumination light received to the projection module along a projection optical axis, and where the illumination optical axis and the projection optical axis are substantially parallel to each other.
Public/Granted literature
- US09733573B2 Optical projection array exposure system Public/Granted day:2017-08-15
Information query
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