公开(公告)号：US20160219684A1

公开(公告)日：2016-07-28

申请号：US15087173

申请日：2016-03-31

Applicant: Applied Materials, Inc.

Inventor： Jeffrey KASKEY ,  Thomas LAIDIG ,  David MARKLE ,  Jang Fung CHEN

IPC: H05B37/04 ,  H05B37/03

CPC classification number: H05B37/04 ,  G03F7/70575 ,  H05B37/03 ,  H05B37/032

Abstract: An illumination system and methods for controlling the illumination system are provided. In one embodiment, the method includes providing a plurality of illumination sources, monitoring optical output power of the plurality of illumination sources over a period of time, and controlling the plurality of illumination sources to maintain a predetermined level of optical output power. The method further includes compensating for degradations of one or more of the plurality of illumination sources to maintain the predetermined level of optical output power, predicting a lifetime of the illumination system based on the parameters of the plurality of illumination sources, and performing periodic maintenance of the plurality of illumination sources according to a quality control schedule.

Abstract translation: 提供照明系统和控制照明系统的方法。 在一个实施例中，该方法包括提供多个照明源，在一段时间内监测多个照明源的光输出功率，以及控制多个照明源以维持预定水平的光输出功率。 该方法还包括补偿多个照明源中的一个或多个照明源的劣化，以维持预定水平的光输出功率，基于多个照明源的参数来预测照明系统的寿命，以及执行定期维护 所述多个照明源根据质量控制调度。

公开(公告)号：US20170219934A1

公开(公告)日：2017-08-03

申请号：US15412530

申请日：2017-01-23

Applicant: Applied Materials, Inc.

Inventor： David MARKLE ,  Thomas LAIDIG ,  Timothy N. THOMAS

IPC: G03F7/20 ,  G02B5/04 ,  G02F1/13 ,  G02B7/04 ,  G02B27/00 ,  F21V8/00 ,  G02B26/08

CPC classification number: G03F7/70641 ,  G02B5/04 ,  G02B6/0008 ,  G02B6/0096 ,  G02B7/04 ,  G02B7/36 ,  G02B26/0833 ,  G02B27/0025 ,  G02F1/1303 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70275

Abstract: Embodiments of the present disclosure generally relate to apparatuses and systems for performing photolithography processes. More particularly, compact apparatuses for projecting an image onto a substrate are provided. In one embodiment, an image projection apparatus includes a light pipe coupled to a first mounting plate, and a frustrated prism assembly, one or more digital micro-mirror devices, one or more beamsplitters, and one or more projection optics, which are coupled to a second mounting plate. The first and second mounting plates are coplanar, such that the image projection apparatus is compact and may be aligned in a system having a plurality of image projection apparatuses, each of which is easily removable and replaceable.

公开(公告)号：US20170168403A1

公开(公告)日：2017-06-15

申请号：US15364748

申请日：2016-11-30

Applicant: Applied Materials, Inc.

Inventor： Benjamin M. JOHNSTON ,  John WHITE ,  Thomas LAIDIG

IPC: G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70775 ,  G03F7/708 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/70933 ,  G03F9/00 ,  G03F9/70 ,  G03F9/7049 ,  G03F9/7057 ,  G03F2009/005

Abstract: Embodiments of the present disclosure generally relate to systems and methods for performing photolithography processes. In one embodiment, laminar gas flow is provided inside a photolithography system during operation. With laminar gas flow instead of turbulent gas flow inside the system, accuracy of the measurement of the location of a substrate disposed inside the system is improved due to the improved signal integrity of interferometers.

公开(公告)号：US20170090303A1

公开(公告)日：2017-03-30

申请号：US14871066

申请日：2015-09-30

Applicant: Applied Materials, Inc.

Inventor： Benjamin M. JOHNSTON ,  Jeffrey KASKEY ,  Thomas LAIDIG

IPC: G03F7/20 ,  F16F15/00 ,  F16F15/02 ,  F16F7/10

CPC classification number: G03F7/70716 ,  F16F7/1011 ,  F16F15/002 ,  F16F15/02 ,  G03F7/709

Abstract: Systems and apparatus for performing photolithography processes are described. The system and apparatus may comprise a slab, at least one stage disposed on the slab, and a vibration damping system disposed on the slab, the vibration damping system comprising a weight that is substantially equal to a weight of one of the at least one stage and a substrate that moves simultaneously with movement of the one of the at least one stage.

公开(公告)号：US20160124316A1

公开(公告)日：2016-05-05

申请号：US14993071

申请日：2016-01-11

Applicant: Applied Materials, Inc.

Inventor： David MARKLE ,  Thomas LAIDIG ,  Jeffrey KASKEY ,  Jang Fung CHEN

IPC: G03F7/20

CPC classification number: G03F7/7015 ,  G03B27/42 ,  G03F7/70291

Abstract: A spatial light modulator imaging system is disclosed. The system comprises an illumination module configured to provide illumination light representing data patterns to be imaged by the spatial light modulator imaging system, a projection module configured to project the illumination light to a substrate, and an illumination-projection beam separator coupled between the illumination module and the projection module, where the illumination-projection beam separator is configured to receive the illumination light along an illumination optical axis and transmit the illumination light received to the projection module along a projection optical axis, and where the illumination optical axis and the projection optical axis are substantially parallel to each other.

Abstract translation: 公开了一种空间光调制器成像系统。 该系统包括：照明模块，被配置为提供表示由空间光调制器成像系统成像的数据图案的照明光;投影模块，被配置为将照明光投影到基板;以及照明投影光束分离器，其耦合在照明模块 以及所述投影模块，其中所述照明投影光束分离器被配置为沿着照明光轴接收照明光，并且沿着投影光轴传输接收到所述投影模块的照明光，并且其中所述照明光轴和所述投影光学 轴基本上彼此平行。