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公开(公告)号：US20180024441A1
公开(公告)日：2018-01-25
申请号：US15656054
申请日：2017-07-21
Applicant: Applied Materials, Inc.
Inventor： David MARKLE , Timothy N. THOMAS
CPC classification number: G03F7/70191 , G02B6/0005 , G02B6/04 , G02B6/102 , G03B21/008 , G03B21/208 , G03F7/70075
Abstract: Implementations disclosed herein generally relate to a light pipe, or kaleido, for homogenizing light such that the light is uniform once the light exits the light pipe. By reflecting the light inside the light pipe, light uniformity is increased. In one implementation, a light pipe for an image projection apparatus is provided. The light pipe comprises an elongated rectangular body having a refractive index that provides total internal reflection within the elongated rectangular body. The elongated rectangular body has an input face for accepting light into the elongated rectangular body. The input face disposed substantially orthogonal to a longitudinal axis of the elongated rectangular body. The elongated rectangular body has an output face for releasing light from the elongated rectangular body. The output face is disposed substantially orthogonal to the longitudinal axis. The elongated rectangular body has a twist along the longitudinal axis.
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公开(公告)号：US20160219684A1
公开(公告)日：2016-07-28
申请号：US15087173
申请日：2016-03-31
Applicant: Applied Materials, Inc.
Inventor： Jeffrey KASKEY , Thomas LAIDIG , David MARKLE , Jang Fung CHEN
CPC classification number: H05B37/04 , G03F7/70575 , H05B37/03 , H05B37/032
Abstract: An illumination system and methods for controlling the illumination system are provided. In one embodiment, the method includes providing a plurality of illumination sources, monitoring optical output power of the plurality of illumination sources over a period of time, and controlling the plurality of illumination sources to maintain a predetermined level of optical output power. The method further includes compensating for degradations of one or more of the plurality of illumination sources to maintain the predetermined level of optical output power, predicting a lifetime of the illumination system based on the parameters of the plurality of illumination sources, and performing periodic maintenance of the plurality of illumination sources according to a quality control schedule.
Abstract translation: 提供照明系统和控制照明系统的方法。 在一个实施例中，该方法包括提供多个照明源，在一段时间内监测多个照明源的光输出功率，以及控制多个照明源以维持预定水平的光输出功率。 该方法还包括补偿多个照明源中的一个或多个照明源的劣化，以维持预定水平的光输出功率，基于多个照明源的参数来预测照明系统的寿命，以及执行定期维护 所述多个照明源根据质量控制调度。
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公开(公告)号：US20190049789A1
公开(公告)日：2019-02-14
申请号：US16076677
申请日：2017-02-10
Applicant: Applied Materials, Inc.
Inventor： David MARKLE , Jang Fung CHEN
Abstract: The present disclosure generally relates to systems and methods for manufacturing wire grid polarizers for LCDs using interference lithography, which are also useful for generating large-area grating patterns. In one embodiment, a method includes depositing a bottom anti-reflective coating layer over an aluminum coated flat panel display substrate, depositing a photoresist layer over the bottom anti-reflective coating layer, and exposing the photoresist layer with an image from a phase grating mask. The exposure with the phase grating mask is done by imaging the ±1 diffraction orders from the phase grating mask onto the substrate using a half Dyson optical system. A plurality of half Dyson systems are generally used in parallel to pattern fine geometry lines and spaces of a wire grid polarizer for a large area substrate. Each half Dyson system includes a primary mirror, a positive lens and a reticle.
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4.发明申请公开(公告)号：US20180335694A1
公开(公告)日：2018-11-22
申请号：US15961601
申请日：2018-04-24
Applicant: Applied Materials, Inc.
Inventor： Jang Fung CHEN , Christopher Dennis BENCHER , David MARKLE
IPC: G03F7/00 , G02B5/30 , G02F1/1335
Abstract: The present disclosure generally relates to methods and systems for manufacturing wire grid polarizers (WGP) using Markle-Dyson exposure systems and dual tone development (DTD) frequency doubling. In one embodiment, the method includes depositing a photoresist layer over an aluminum-coated display substrate, patterning the photoresist layer by dual tone development using a Markle-Dyson system to form a photoresist pattern, and transferring the photoresist pattern into the aluminum-coated display substrate to manufacture a WGP having finer pitch, for example less than or equal to about 100 nm, and increased frequency.
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公开(公告)号：US20170219934A1
公开(公告)日：2017-08-03
申请号：US15412530
申请日：2017-01-23
Applicant: Applied Materials, Inc.
Inventor： David MARKLE , Thomas LAIDIG , Timothy N. THOMAS
CPC classification number: G03F7/70641 , G02B5/04 , G02B6/0008 , G02B6/0096 , G02B7/04 , G02B7/36 , G02B26/0833 , G02B27/0025 , G02F1/1303 , G03F7/7005 , G03F7/70075 , G03F7/70275
Abstract: Embodiments of the present disclosure generally relate to apparatuses and systems for performing photolithography processes. More particularly, compact apparatuses for projecting an image onto a substrate are provided. In one embodiment, an image projection apparatus includes a light pipe coupled to a first mounting plate, and a frustrated prism assembly, one or more digital micro-mirror devices, one or more beamsplitters, and one or more projection optics, which are coupled to a second mounting plate. The first and second mounting plates are coplanar, such that the image projection apparatus is compact and may be aligned in a system having a plurality of image projection apparatuses, each of which is easily removable and replaceable.
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Patent Agency Ranking
公开(公告)号：US20230296907A1
公开(公告)日：2023-09-21
申请号：US17919017
申请日：2021-01-20
Applicant: Applied Materials, Inc.
Inventor： Ulrich MUELLER , David MARKLE
CPC classification number: G02B27/0927 , G02B26/0816 , G02B27/283
Abstract: The present disclosure provides an apparatus and method for fabricating optical devices. The apparatus includes a support table having process chambers and a laser used to direct a beam along a propagation path to each of the process chambers. A central mirror is centrally disposed among the process chambers and is rotatable to reflect the beam to each of the process chambers for processing. A beam splitter is disposed within each of process chambers, each beam splitter is used to receive beams from the central mirror and emits a first beam in a first direction and a second beam in a second direction. A first mirror directs the first beam to a device and a second mirror directs the second beam to the device. Each of the first and second mirror is rotatable in at least three axes.
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公开(公告)号：US20210191285A1
公开(公告)日：2021-06-24
申请号：US17057536
申请日：2019-05-31
Applicant: Applied Materials, Inc.
Inventor： David MARKLE , Hwan J. JEONG
Abstract: A lithography system for generating grating structures is provided having a multiple column imaging system located on a bridge capable of moving in a cross-scan direction, a mask having a grating pattern with a fixed spatial frequency located in an object plane of the imaging system, a multiple line alignment mark aligned to the grating pattern and having a fixed spatial frequency, a platen configured to hold and scan a substrate, a scanning system configured to move the platen over a distance greater than a desired length of the grating pattern on the substrate, a longitudinal encoder scale attached to the platen and oriented in a scan direction and at least two encoder scales attached to the platen and arrayed in the cross-scan direction wherein the scales contain periodically spaced alignment marks having a fixed spatial frequency.
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公开(公告)号：US20220174246A1
公开(公告)日：2022-06-02
申请号：US17109581
申请日：2020-12-02
Applicant: Applied Materials, Inc.
Inventor： Christopher Dennis BENCHER , David MARKLE
IPC: H04N9/31
Abstract: Examples described herein provide a projection system, and a software application and a method related thereto. A system includes a pixelated light source and an optical relay. The pixelated light source includes an array of spatial light modulator pixels. Each spatial light modulator pixel being individually controllable to selectively project a beam of light. The optical relay includes an optically reflective surface and an actuator coupled to the optically reflective surface. The actuator is configured to move the optically reflective surface. The pixelated light source and the optical relay are configured such that one or more beams projected from the pixelated light source are reflected off of the optically reflective surface and form an image of the optical relay in a focal plane. Movement of the optically reflective surface causes the respective beams to be at varying locations in the focal plane.
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公开(公告)号：US20190339622A1
公开(公告)日：2019-11-07
申请号：US16509675
申请日：2019-07-12
Applicant: Applied Materials, Inc.
Inventor： Christopher Dennis BENCHER , Joseph R. JOHNSON , David MARKLE , Mehdi VAEZ-IRAVANI
Abstract: Embodiments of the present disclosure provide methods for producing images on substrates. The method includes providing a p-polarization beam to a first mirror cube having a first digital micromirror device (DMD), providing an s-polarization beam to a second mirror cube having a second DMD, and reflecting the p-polarization beam off the first DMD and reflecting the s-polarization beam off the second DMD such that the p-polarization beam and the s-polarization beam are reflected towards a light altering device configured to produce a plurality of superimposed images on the substrate.
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公开(公告)号：US20180017781A1
公开(公告)日：2018-01-18
申请号：US15639600
申请日：2017-06-30
Applicant: Applied Materials, Inc.
Inventor： David MARKLE , Thomas L. LAIDIG , Timothy N. THOMAS , Jang Fung CHEN
CPC classification number: G02B26/0833 , G02B5/04 , G02F1/1303 , G03F7/7015 , G03F7/70275
Abstract: The present disclosure generally relates to frustrated cube assemblies having a first prism having a first surface, a second surface, and a first hypotenuse, and a second prism having a third surface, a fourth surface, and a second hypotenuse. The first and second hypotenuses face one another and are separated by an air gap. The frustrated cube assembly may include a tilted mirror adjacent the second surface. The second surface may be a reflective diffraction grating. Light is reflected to a digital micromirror device (DMD) adjacent to the frustrated cube assembly at a normal incidence angle and through an image projection system along a single optical axis. The direction of light incident on the DMD is such that light reflected from an “on” mirror is directed along the normal to the DMD surface and at 45 degrees to the hypotenuses. The input and output light beams are parallel.
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