Invention Application
- Patent Title: LASER ANNEALING APPARATUS
- Patent Title (中): 激光退火设备
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Application No.: US14881414Application Date: 2015-10-13
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Publication No.: US20160126119A1Publication Date: 2016-05-05
- Inventor: Joonghan SHIN , Bongjin KUH , Wanit MANOROTKUL , Hanmei CHOI
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Priority: KR10-2014-0153079 20141105
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/683 ; H01L21/324 ; B23K26/00 ; H01L21/687
Abstract:
A laser annealing apparatus includes a process chamber with a chamber window to transmit a laser beam, and a chuck in the process chamber, a top surface of the chuck supporting a loaded substrate, and a width of the chuck being smaller than a width of the loaded substrate.
Information query
IPC分类:
