Invention Application
US20160126149A1 METHOD FOR PROCESSING A SUBSTRATE AND A METHOD OF PROCESS SCREENING FOR INTEGRATED CIRCUITS 有权
用于处理基板的方法和用于集成电路的处理筛选方法

METHOD FOR PROCESSING A SUBSTRATE AND A METHOD OF PROCESS SCREENING FOR INTEGRATED CIRCUITS
Abstract:
According to various embodiments, a method for processing a substrate may include: forming a dielectric layer over the substrate, the dielectric layer may include a plurality of test regions; forming an electrically conductive layer over the dielectric layer to contact the dielectric layer in the plurality of test regions; simultaneously electrically examining the dielectric layer in the plurality of test regions, wherein portions of the electrically conductive layer contacting the dielectric layer in the plurality of test regions are electrically conductively connected with each other by an electrically conductive material; and separating the electrically conductive layer into portions of the electrically conductive layer contacting the dielectric layer in the plurality of test regions from each other.
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