Invention Application
- Patent Title: Reduced Scale Resonant Tunneling Field Effect Transistor
- Patent Title (中): 缩小谐振隧道场效应晶体管
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Application No.: US14942274Application Date: 2015-11-16
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Publication No.: US20160133699A1Publication Date: 2016-05-12
- Inventor: Uygar E. Avci , Dmitri E. Nikonov , Ian A. Young
- Applicant: Intel Corporation
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/10 ; H01L29/267 ; H01L29/775 ; H01L29/165 ; H01L29/205 ; H01L29/08

Abstract:
An embodiment includes a heterojunction tunneling field effect transistor including a source, a channel, and a drain; wherein (a) the channel includes a major axis, corresponding to channel length, and a minor axis that corresponds to channel width and is orthogonal to the major axis; (b) the channel length is less than 10 nm long; (c) the source is doped with a first polarity and has a first conduction band; (d) the drain is doped with a second polarity, which is opposite the first polarity, and the drain has a second conduction band with higher energy than the first conduction band. Other embodiments are described herein.
Public/Granted literature
- US09583566B2 Reduced scale resonant tunneling field effect transistor Public/Granted day:2017-02-28
Information query
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