Invention Application
- Patent Title: SEMICONDUCTOR DEVICE, MANUFACTURING METHOD THEREOF AND IMAGING APPARATUS
- Patent Title (中): 半导体器件及其制造方法及成像装置
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Application No.: US14935973Application Date: 2015-11-09
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Publication No.: US20160133763A1Publication Date: 2016-05-12
- Inventor: Takaaki Negoro , Yoshinori Ueda , Katsuyuki Sakurano , Yasukazu Nakatani , Kazuhiro Yoneda , Katsuhiko Aisu
- Applicant: Takaaki Negoro , Yoshinori Ueda , Katsuyuki Sakurano , Yasukazu Nakatani , Kazuhiro Yoneda , Katsuhiko Aisu
- Applicant Address: JP Tokyo
- Assignee: RICOH COMPANY, LTD
- Current Assignee: RICOH COMPANY, LTD
- Current Assignee Address: JP Tokyo
- Priority: JP2014-228766 20141111
- Main IPC: H01L31/0224
- IPC: H01L31/0224 ; H04N5/378 ; H04N5/361 ; H01L31/18 ; H01L31/0352

Abstract:
A semiconductor device for converting incident light into an electric current includes a semiconductor substrate; an electrode embedded in the semiconductor substrate; an insulation film contacting the electrode in the semiconductor substrate; a first semiconductor region of a first conductivity type, a second semiconductor region of a second conductivity type and a third semiconductor region of the first conductivity type, formed sequentially in a depth direction from a side of a front face of the semiconductor substrate; and a fourth semiconductor region of the second conductivity type contacting the insulation film and the second semiconductor region. An impurity concentration of the fourth semiconductor region is greater than an impurity concentration of the second semiconductor region.
Public/Granted literature
- US09923019B2 Semiconductor device, manufacturing method thereof and imaging apparatus Public/Granted day:2018-03-20
Information query
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