Invention Application
- Patent Title: Alcohol Assisted ALD Film Deposition
- Patent Title (中): 酒精辅助ALD膜沉积
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Application No.: US14920001Application Date: 2015-10-22
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Publication No.: US20160145738A1Publication Date: 2016-05-26
- Inventor: Feng Q. Liu , Mei Chang , David Thompson
- Applicant: Applied Materials, Inc.
- Main IPC: C23C16/18
- IPC: C23C16/18 ; C23C16/455 ; C23C16/458 ; C23C16/02
Abstract:
Methods of depositing a metal selectively onto a metal surface relative to a dielectric surface are described. Methods include reducing a metal oxide surface to a metal surface and protecting a dielectric surface to minimize deposition thereon and exposing the substrate to a metal precursor and an alcohol to deposit a film.
Public/Granted literature
- US09914995B2 Alcohol assisted ALD film deposition Public/Granted day:2018-03-13
Information query
IPC分类:
