Invention Application
US20160161846A1 THE USE OF SURFACTANTS HAVING AT LEAST THREE SHORT-CHAIN PERFLUORINATED GROUPS IN FORMULATIONS FOR PHOTO MASK CLEANING
有权
具有至少三个短链全氟化合物组合的表面活性剂在照相胶片清洁剂中的应用
- Patent Title: THE USE OF SURFACTANTS HAVING AT LEAST THREE SHORT-CHAIN PERFLUORINATED GROUPS IN FORMULATIONS FOR PHOTO MASK CLEANING
- Patent Title (中): 具有至少三个短链全氟化合物组合的表面活性剂在照相胶片清洁剂中的应用
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Application No.: US14904018Application Date: 2014-07-08
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Publication No.: US20160161846A1Publication Date: 2016-06-09
- Inventor: Andreas Klipp , Andrei Honciuc , Chu-Ya Yang
- Applicant: BASF SE
- Priority: EP13176102.5 20130711
- International Application: PCT/IB2014/062938 WO 20140708
- Main IPC: G03F1/82
- IPC: G03F1/82 ; G03F7/32 ; G03F7/20 ; C11D1/00 ; G03F1/24
Abstract:
In a method for cleaning photo masks having patterns with smallest line-space dimensions below 200 nm, a surfactant composition A is used, wherein A contains at least three short-chain perfluorinated groups Rf selected from the group consisting of trifluoromethyl, pentafluoroethyl, 1-heptafluoropropyl, 2-heptafluoropropyl, and pentafluorosulfanyl and wherein A exhibits, at a 1% by weight aqueous solution, a static surface tension below 25 mN/m.
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