Invention Application
- Patent Title: SELENIZATION PROCESS APPARATUS FOR GLASS SUBSTRATE
- Patent Title (中): 玻璃基板的放电过程装置
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Application No.: US14565602Application Date: 2014-12-10
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Publication No.: US20160172220A1Publication Date: 2016-06-16
- Inventor: WEN-CHUEH PAN , TSANG-MING HSU , TSANTUNG CHEN , JEN-CHIEH LI , SHIH-SHAN WEI
- Applicant: NATIONAL CHUNG SHAN INSTITUTE OF SCIENCE AND TECHNOLOGY
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/677 ; H01L31/032

Abstract:
A selenization process apparatus for a glass substrate includes a first heating unit disposed in a chamber; a conveying heating module disposed in the chamber and below the first heating unit to not only drive the glass substrate to move but also heat the glass substrate, wherein a thermal mark otherwise formed as a result of contact between the conveying heating module and the glass substrate is reduced with an inert gas; a selenium gas feeding module connected to the chamber to introduce selenium gas into the chamber; and a gas recycling module connected to the chamber to recycle the selenium gas and the inert gas. The glass substrate is prevented from staying at a soaking temperature above the softening point for a long period of time. Selenization temperature is increased to speed up the selenization process. The selenium gas and the inert gas are recycled and reused.
Information query
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