Invention Application
- Patent Title: CLEANING COMPOSITION
- Patent Title (中): 清洁组合物
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Application No.: US14578381Application Date: 2014-12-20
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Publication No.: US20160175051A1Publication Date: 2016-06-23
- Inventor: John J. Matta , Tuan Nguyen , Huyen Phuong Bui
- Applicant: Medivators Inc.
- Main IPC: A61B19/00
- IPC: A61B19/00 ; C11D11/00 ; C11D3/00 ; A61B1/005 ; C11D3/33 ; B08B9/02 ; A61B1/12 ; C11D1/72 ; C11D3/20

Abstract:
Provided herein is a composition that includes: (i) chelator (e.g., ethylenediaminetetraacetic acid (EDTA)), (ii) buffer system (e.g., potassium phosphate dibasic and sodium hydroxide), (iii) cleaner (e.g., diethyl glycol monoethyl ether), (iv) solubilizer (e.g., propylene glycol), and (v) diluent (e.g., water), wherein the composition has a pH of at least about 9.5. Also provided is a method of cleaning a medical device that includes contacting the medical device with the composition described herein, for a period of time effective to clean the medical device. Subsequent to the cleaning, the medical device can optionally be disinfected, dried, and stored.
Public/Granted literature
- US09693675B2 Cleaning composition Public/Granted day:2017-07-04
Information query