Invention Application
- Patent Title: Method of manufacturing a semiconductor component and semiconductor component
- Patent Title (中): 制造半导体部件和半导体部件的方法
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Application No.: US14757589Application Date: 2015-12-23
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Publication No.: US20160181138A1Publication Date: 2016-06-23
- Inventor: Georg Meyer-Berg , Edward Fuergut , Joachim Mahler
- Applicant: Infineon Technologies AG
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Priority: DE102014119620.1 20141223
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H01L21/768 ; H01L21/56 ; H01L23/528 ; H01L21/78

Abstract:
Various embodiments provide method of manufacturing a semiconductor component, wherein the method comprises providing a layer stack comprising a carrier and a thinned wafer comprising a metallization layer on one side, wherein the thinned wafer is placed on a first side of the carrier; forming an encapsulation encapsulating the layer stack at least partially; and subsequently thinning the carrier from a second side of the carrier, wherein the second side is opposite to the first side of the carrier.
Public/Granted literature
- US10121690B2 Method of manufacturing a semiconductor component and semiconductor component Public/Granted day:2018-11-06
Information query
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