Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND METHOD
- Patent Title (中): LITHOGRAPHIC设备和方法
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Application No.: US15078814Application Date: 2016-03-23
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Publication No.: US20160202618A1Publication Date: 2016-07-14
- Inventor: Thibault Simon Mathieu LAURENT , Gerardus Adrianus Antonius Maria KUSTERS , Bastiaan Andreas Wilhelmus Hubertus KNARREN , Raymond Wilhelmus Louis LAFARRE , Koen STEFFENS , Takeshi KANEKO , Robbert Jan VOOGD , Gregory Martin Mason CORCORAN , Ruud Hendrikus Martinus Johannes BLOKS , Johan Gertrudis Cornelis KUNNEN , Ramin BADIE
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
A substrate table to support a substrate on a substrate supporting area, the substrate table having a heat transfer fluid channel at least under the substrate supporting area, and a plurality of heaters and/or coolers to thermally control the heat transfer fluid in the channel at a location under the substrate supporting area.
Public/Granted literature
- US09823589B2 Lithographic apparatus and method Public/Granted day:2017-11-21
Information query
IPC分类:
