Invention Application
- Patent Title: INTEGRATED HYBRID LASER SOURCE COMPATIBLE WITH A SILICON TECHNOLOGY PLATFORM, AND FABRICATION PROCESS
- Patent Title (中): 一体化混合激光源与硅技术平台兼容,制造工艺
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Application No.: US14945859Application Date: 2015-11-19
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Publication No.: US20160233641A1Publication Date: 2016-08-11
- Inventor: Alain CHANTRE , Charles BAUDOT , Sébastien CREMER
- Applicant: STMICROELECTRONICS SA , STMICROELECTRONICS (CROLLES 2) SAS
- Priority: FR1550990 20150209
- Main IPC: H01S5/026
- IPC: H01S5/026 ; H01S5/22 ; H01S5/125

Abstract:
A photonic integrated circuit includes a first insulating region encapsulating at least one metallization level, a second insulating region at least partially encapsulating a gain medium of a laser source, and a stacked structure placed between the two insulating regions. The stacked structure includes a first polycrystalline or single-crystal silicon layer, a second polycrystalline or single-crystal silicon layer, an intermediate layer optically compatible with the wavelength of the laser source and selectively etchable relative to silicon and that separates the first layer from a first portion of the second layer, and the gain medium facing at least one portion of the first layer. The first layer, the intermediate layer, and the first portion of the second layer form an assembly containing a resonant cavity and a waveguide, which are optically coupled to the gain medium, and a second portion of the second layer containing at least one other photonic component.
Public/Granted literature
- US09461441B2 Integrated hybrid laser source compatible with a silicon technology platform, and fabrication process Public/Granted day:2016-10-04
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