Invention Application
- Patent Title: SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Patent Title (中): 半导体器件及其制造方法
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Application No.: US15047940Application Date: 2016-02-19
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Publication No.: US20160254386A1Publication Date: 2016-09-01
- Inventor: Shunpei YAMAZAKI , Tetsuhiro TANAKA , Akihisa SHIMOMURA , Ryo TOKUMARU , Yasumasa YAMANE , Yuhei SATO , Naoki OKUNO , Motoki NAKASHIMA
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Priority: JP2015-039085 20150227
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L29/06 ; H01L29/51

Abstract:
Provided is a transistor with stable electrical characteristics. Provided is a semiconductor device including an oxide semiconductor over a substrate, a first conductor in contact with a top surface of the oxide semiconductor, a second conductor in contact with the top surface of the oxide semiconductor, a first insulator over the first and second conductors and in contact with the top surface of the oxide semiconductor, a second insulator over the first insulator, a third conductor over the second insulator, and a third insulator over the third conductor. The third conductor overlaps with the first conductor with the first and second insulators positioned therebetween, and overlaps with the second conductor with the first and second insulators positioned therebetween. The first insulator contains oxygen. The second insulator transmits less oxygen than the first insulator. The third insulator transmits less oxygen than the first insulator.
Public/Granted literature
- US09653613B2 Semiconductor device and manufacturing method thereof Public/Granted day:2017-05-16
Information query
IPC分类: