发明申请
- 专利标题: METHOD FOR SURFACE-MODIFYING NEURAL ELECTRODE
- 专利标题(中): 表面修饰神经电极的方法
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申请号: US15056948申请日: 2016-02-29
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公开(公告)号: US20160258070A1公开(公告)日: 2016-09-08
- 发明人: Yong Hee KIM , Sang-Don JUNG
- 申请人: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
- 优先权: KR10-2015-0030383 20150304
- 主分类号: C23F1/44
- IPC分类号: C23F1/44 ; C25D5/10 ; A61B5/04 ; C25D3/46 ; C23F1/30 ; C23F1/14 ; C25D7/00 ; C25D3/48
摘要:
In a method for surface-modifying a neural electrode, a neural electrode array is formed, first and second metal nanoparticles having different solubilities with respect to an etching solution are simultaneously electrode-deposited on a surface of the neural electrode array, and the second metal nanoparticles are selectively etched using the etching solution, thereby forming a porous structure including the first metal nanoparticles on the surface of the neural electrode array.
公开/授权文献
- US09650720B2 Method for surface-modifying neural electrode 公开/授权日:2017-05-16
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