发明申请
- 专利标题: PLATING APPARATUS
- 专利标题(中): 电镀设备
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申请号: US15058108申请日: 2016-03-01
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公开(公告)号: US20160258080A1公开(公告)日: 2016-09-08
- 发明人: Masaaki KIMURA , Mitsutoshi YAHAGI
- 申请人: EBARA CORPORATION
- 优先权: JP2015-043306 20150305
- 主分类号: C25D17/08
- IPC分类号: C25D17/08 ; C25D17/00 ; C25D17/02
摘要:
There is disclosed a plating apparatus which can dispose an anode, a substrate and a regulation plate parallel to each other in such a manner that the center of the anode, the center of the substrate and the center of an opening of the regulation plate are aligned in a straight line. A frame of the plating apparatus includes: a support for supporting upper portions of an anode holder, a substrate holder and the regulation plate; a box structure secured to the support; an upper positioning structure for fixing a relative position between the support and the upper portions of the anode holder, the substrate holder and the regulation plate; and a lower positioning structure for fixing a relative position between the box structure and lower portions of the anode holder, the substrate holder and the regulation plate.
公开/授权文献
- US10106906B2 Plating apparatus 公开/授权日:2018-10-23
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