发明申请
- 专利标题: DEBRIS REMOVAL FROM HIGH ASPECT STRUCTURES
- 专利标题(中): 从高层结构中去除
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申请号: US15160302申请日: 2016-05-20
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公开(公告)号: US20160266165A1公开(公告)日: 2016-09-15
- 发明人: TOD EVAN ROBINSON , BERNABE J. ARRUZA , KENNETH GILBERT ROESSLER , DAVID BRINKLEY , JEFFREY E. LECLAIRE
- 申请人: RAVE LLC
- 主分类号: G01Q10/00
- IPC分类号: G01Q10/00 ; G01N15/14 ; B08B7/00 ; G01N15/10 ; B08B9/087 ; B08B6/00
摘要:
A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.
公开/授权文献
- US10330581B2 Debris removal from high aspect structures 公开/授权日:2019-06-25
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