Invention Application
- Patent Title: METHOD AND APPARATUS FOR INSPECTION AND METROLOGY
- Patent Title (中): 检验和计量方法与装置
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Application No.: US15065674Application Date: 2016-03-09
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Publication No.: US20160266503A1Publication Date: 2016-09-15
- Inventor: Peter Danny Van Voorst , Duygu Akbulut , Koos Van Berkel , Jeroen Johan Maarten Van De Wijdeven , Ferry Zijp
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP15158677.3 20150311
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G01B11/00 ; G02B27/09

Abstract:
A method of position control of an optical component relative to a surface is disclosed. The method may include: obtaining a first signal by a first position measurement process; controlling relative movement between the optical component and the surface for a first range of motion using the first signal; obtaining a second signal by a second position measurement process different than the first position measurement process; and controlling relative movement between the optical component and the surface for a second range of motion using the second signal, the second range of motion being nearer the surface than the first range of motion.
Public/Granted literature
- US09811001B2 Method and apparatus for inspection and metrology Public/Granted day:2017-11-07
Information query
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