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1.发明申请公开(公告)号：US20190204757A1
公开(公告)日：2019-07-04
申请号：US16233707
申请日：2018-12-27
Applicant: ASML Netherlands B.V.
Inventor： Gerrit Jacobus Hendrik BRUSSAARD , Petrus Wilhelmus Smorenburg , Teis Johan Coenen , Niels Geypen , Peter Danny Van Voorst , Sander Bas Roobol
IPC: G03F7/20
Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprising a plurality of wavelengths onto the structure; a first detector configured to detect at least part of the illumination radiation which has been diffracted from the structure; and additional optics configured to produce, on at least a portion of the first detector, a wavelength-dependent spatial distribution of different wavelengths of the illumination radiation which has been diffracted from the structure, wherein the first detector is arranged to detect at least a non-zero diffraction order of the illumination radiation which has been diffracted from the structure.
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公开(公告)号：US11815402B2
公开(公告)日：2023-11-14
申请号：US17425646
申请日：2019-12-19
Applicant: ASML Netherlands B.V.
Inventor： Sietse Thijmen Van Der Post , Peter Danny Van Voorst
CPC classification number: G01J9/00 , G01N23/207 , G02B3/0037 , G02B5/1819 , G02B5/1838 , G03F7/70616 , G21K1/065 , G01J2009/002
Abstract: Disclosed is a wavefront sensor for measuring a tilt of a wavefront at an array of locations across a beam of radiation, wherein said wavefront sensor comprises a film, for example of Zirconium, having an indent array comprising an indent at each of said array of locations, such that each indent of the indent array is operable to perform focusing of said radiation. Also disclosed is a radiation source and inspection apparatus comprising such a wavefront sensor.
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公开(公告)号：US09811001B2
公开(公告)日：2017-11-07
申请号：US15065674
申请日：2016-03-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Peter Danny Van Voorst , Duygu Akbulut , Koos Van Berkel , Jeroen Johan Maarten Van De Wijdeven , Ferry Zijp
IPC: G01B11/04 , G02B7/02 , G03B27/32 , G03B27/74 , G03F7/20 , G02B21/00 , G01N21/956 , G01B11/00 , G02B27/09
CPC classification number: G03F7/70483 , G01B11/00 , G01N21/956 , G02B21/0016 , G02B21/33 , G02B27/0988 , G03F7/70625 , G03F7/70633
Abstract: A method of position control of an optical component relative to a surface is disclosed. The method may include: obtaining a first signal by a first position measurement process; controlling relative movement between the optical component and the surface for a first range of motion using the first signal; obtaining a second signal by a second position measurement process different than the first position measurement process; and controlling relative movement between the optical component and the surface for a second range of motion using the second signal, the second range of motion being nearer the surface than the first range of motion.
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4.发明授权公开(公告)号：US10330606B2
公开(公告)日：2019-06-25
申请号：US15683216
申请日：2017-08-22
Applicant: ASML Netherlands B.V.
Inventor： Peter Danny Van Voorst , Nan Lin , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen , Sietse Thijmen Van Der Post
IPC: G01N21/88 , G03F7/20 , G01N21/95 , H05G2/00 , G01N21/956
Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.
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公开(公告)号：US10185224B2
公开(公告)日：2019-01-22
申请号：US15569086
申请日：2016-04-19
Applicant: ASML Netherlands B.V.
Inventor： Ferry Zijp , Duygu Akbulut , Peter Danny Van Voorst , Jeroen Johan Maarten Van De Wijdeven , Koos Van Berkel
Abstract: A method involving providing incident radiation of a first polarization state by an optical component into an interface of an object with an external environment, wherein a surface is provided adjacent the interface and separated by a gap from the interface, detecting, from incident radiation reflected from the interface and from the surface, radiation of a second different polarization state arising from the reflection of incident radiation of the first polarization at the interface as distinct from the radiation of the first polarization state in the reflected radiation, and producing a position signal representative of a relative position between the focus of the optical component and the object.
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Patent Agency Ranking
6.发明授权公开(公告)号：US10670974B2
公开(公告)日：2020-06-02
申请号：US16233707
申请日：2018-12-27
Applicant: ASML Netherlands B.V.
Inventor： Gerrit Jacobus Hendrik Brussaard , Petrus Wilhelmus Smorenburg , Teis Johan Coenen , Niels Geypen , Peter Danny Van Voorst , Sander Bas Roobol
IPC: G03F7/20
Abstract: A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprising a plurality of wavelengths onto the structure; a first detector configured to detect at least part of the illumination radiation which has been diffracted from the structure; and additional optics configured to produce, on at least a portion of the first detector, a wavelength-dependent spatial distribution of different wavelengths of the illumination radiation which has been diffracted from the structure, wherein the first detector is arranged to detect at least a non-zero diffraction order of the illumination radiation which has been diffracted from the structure.
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7.发明申请公开(公告)号：US20190003981A1
公开(公告)日：2019-01-03
申请号：US16102178
申请日：2018-08-13
Applicant: ASML Netherlands B.V.
Inventor： Peter Danny Van Voorst , Nan Lin , Sander Bas Roobol , Simon Gijsbert Josephus Mathijssen , Sietse Thijmen Van Der Post
IPC: G01N21/88 , G03F7/20 , G01N21/95 , G01N21/956 , H05G2/00
CPC classification number: G01N21/8806 , G01N21/9501 , G01N2021/95676 , G03F7/70616 , G03F7/7065 , H05G2/00 , H05G2/008
Abstract: Disclosed is an inspection apparatus and associated method for measuring a target structure on a substrate. The inspection apparatus comprises an illumination source for generating measurement radiation; an optical arrangement for focusing the measurement radiation onto said target structure; and a compensatory optical device. The compensatory optical device may comprise an SLM operable to spatially modulate the wavefront of the measurement radiation so as to compensate for a non-uniform manufacturing defect in said optical arrangement. In alternative embodiments, the compensatory optical device may be located in the beam of measurement radiation, or in the beam of pump radiation used to generate high harmonic radiation in a HHG source. Where located in the beam of pump radiation, the compensatory optical device may be used to correct pointing errors, or impart a desired profile or varying illumination pattern in a beam of the measurement radiation.
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公开(公告)号：US20160266503A1
公开(公告)日：2016-09-15
申请号：US15065674
申请日：2016-03-09
Applicant: ASML NETHERLANDS B.V.
Inventor： Peter Danny Van Voorst , Duygu Akbulut , Koos Van Berkel , Jeroen Johan Maarten Van De Wijdeven , Ferry Zijp
CPC classification number: G03F7/70483 , G01B11/00 , G01N21/956 , G02B21/0016 , G02B21/33 , G02B27/0988 , G03F7/70625 , G03F7/70633
Abstract: A method of position control of an optical component relative to a surface is disclosed. The method may include: obtaining a first signal by a first position measurement process; controlling relative movement between the optical component and the surface for a first range of motion using the first signal; obtaining a second signal by a second position measurement process different than the first position measurement process; and controlling relative movement between the optical component and the surface for a second range of motion using the second signal, the second range of motion being nearer the surface than the first range of motion.
Abstract translation: 公开了一种光学部件相对于表面的位置控制的方法。 该方法可以包括：通过第一位置测量处理获得第一信号; 使用所述第一信号来控制所述光学部件和所述表面之间的第一运动范围的相对运动; 通过与第一位置测量处理不同的第二位置测量处理获得第二信号; 以及使用所述第二信号来控制所述光学部件和所述表面之间的相对运动的第二运动范围，所述第二运动范围比所述第一运动范围更靠近所述表面。
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公开(公告)号：US11243470B2
公开(公告)日：2022-02-08
申请号：US16331547
申请日：2017-08-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Nitish Kumar , Adrianus Johannes Hendrikus Schellekens , Sietse Thijmen Van Der Post , Ferry Zijp , Willem Maria Julia Marcel Coene , Peter Danny Van Voorst , Duygu Akbulut , Sarathi Roy
IPC: G03F7/20
Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.
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公开(公告)号：US11129266B2
公开(公告)日：2021-09-21
申请号：US16566133
申请日：2019-09-10
Applicant: ASML Netherlands B.V.
Inventor： Peter Danny Van Voorst
Abstract: There is described an optical system (400) for focusing a beam of radiation (B) on a region of interest of a substrate in a metrology apparatus. The beam of radiation comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system comprises a first reflector system (410) and a second reflector system (412). Each of the first and second reflector systems (410, 412) comprises a finite-to-finite Wolter reflector system. The optical system (400) is configured to form, on the region of interest, a demagnified image (414) of an object (416) comprising an apparent source of the beam of radiation (B).
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