发明申请
US20160276452A1 Method for Manufacturing a Semiconductor Device Having a Schottky Contact 审中-公开
具有肖特基接触的半导体器件的制造方法

Method for Manufacturing a Semiconductor Device Having a Schottky Contact
摘要:
A semiconductor device includes an n-doped monocrystalline semiconductor substrate having a substrate surface, an amorphous n-doped semiconductor surface layer at the substrate surface of the n-doped monocrystalline semiconductor substrate, and a Schottky-junction forming material in contact with the amorphous n-doped semiconductor surface layer. The Schottky-junction forming material forms at least one Schottky contact with the amorphous n-doped semiconductor surface layer.
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