Invention Application
- Patent Title: RETICLE, SYSTEM COMPRISING A PLURALITY OF RETICLES AND METHOD FOR THE FORMATION THEREOF
- Patent Title (中): 包含多种反应物的系统的制度及其形成方法
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Application No.: US14674157Application Date: 2015-03-31
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Publication No.: US20160291457A1Publication Date: 2016-10-06
- Inventor: Guido Ueberreiter , Guoxiang Ning , Jui-Hsuan Feng , Paul Ackmann , Chin Teong Lim
- Applicant: GLOBALFOUNDRIES Inc.
- Main IPC: G03F1/36
- IPC: G03F1/36 ; H01L21/768 ; G03F7/30

Abstract:
A method includes providing a pre-optical proximity correction (OPC) layout of at least a portion of at least one reticle. The pre-OPC layout defines a test cell including a first test cell area having a plurality of first target features having a first pitch and a second test cell area having a plurality of second target features having a second pitch. A post-OPC layout of the portion of the reticle is formed on the basis of the pre-OPC layout. The formation of the post-OPC layout includes performing a rule-based OPC process, wherein a plurality of first reticle features for the first test cell area are provided on the basis of the plurality of first target features, and performing a model-based OPC process, wherein a plurality of second reticle features for the second test cell area are provided on the basis of the plurality of second target features.
Public/Granted literature
- US09535319B2 Reticle, system comprising a plurality of reticles and method for the formation thereof Public/Granted day:2017-01-03
Information query