Invention Application
- Patent Title: METHOD AND HARDWARE FOR CLEANING UV CHAMBERS
- Patent Title (中): 清洁紫外线灯的方法和硬件
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Application No.: US15180514Application Date: 2016-06-13
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Publication No.: US20160296981A1Publication Date: 2016-10-13
- Inventor: Sanjeev BALUJA , Alexandros T. DEMOS , Kelvin CHAN , Juan Carlos ROCHA-ALVAREZ , Scott A. HENDRICKSON , Abhijit KANGUDE , Inna TUREVSKY , Mahendra CHHABRA , Thomas NOWAK , Daping YAO , Bo XIE , Daemian RAJ
- Applicant: Applied Materials, Inc.
- Main IPC: B08B7/00
- IPC: B08B7/00 ; B08B5/00 ; C23C16/48 ; C23C16/44 ; C23C16/455 ; B08B9/08 ; B08B17/02

Abstract:
A cleaning method for a UV chamber involves providing a first cleaning gas, a second cleaning gas, and a purge gas to one or more openings in the chamber. The first cleaning gas may be an oxygen containing gas, such as ozone, to remove carbon residues. The second cleaning gas may be a remote plasma of NF3 and O2 to remove silicon residues. The UV chamber may have two UV transparent showerheads, which together with a UV window in the chamber lid, define a gas volume proximate the UV window and a distribution volume below the gas volume. A purge gas may be flowed through the gas volume while one or more of the cleaning gases is flowed into the distribution volume to prevent the cleaning gases from impinging on the UV transparent window.
Public/Granted literature
- US09506145B2 Method and hardware for cleaning UV chambers Public/Granted day:2016-11-29
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