发明申请
US20160320713A1 SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TRANSFER METHOD, AND COMPUTER STORAGE MEDIUM
审中-公开
基板处理系统,基板传输方法和计算机存储介质
- 专利标题: SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TRANSFER METHOD, AND COMPUTER STORAGE MEDIUM
- 专利标题(中): 基板处理系统,基板传输方法和计算机存储介质
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申请号: US15105132申请日: 2014-10-30
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公开(公告)号: US20160320713A1公开(公告)日: 2016-11-03
- 发明人: Takuya MORI , Masaru TOMONO
- 申请人: TOKYO ELECTRON LIMITED
- 优先权: JP2013-269251 20131226
- 国际申请: PCT/JP2014/078909 WO 20141030
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; H01L21/67 ; H01L21/66 ; H01L21/677
摘要:
A substrate treatment system includes: a treatment station including a plurality of treatment apparatuses; an interface station which delivers a substrate to/from an exposure apparatus provided outside the system and including a plurality of exposure stages; a plurality of substrate inspection apparatuses; a substrate transfer mechanism which transfers the substrate between each of the treatment apparatuses in the treatment station and the substrate inspection apparatus; and a control apparatus which identifies an exposure stage which has been used in exposure processing of a substrate from among the plurality of exposure stages, and controls the substrate transfer mechanism to transfer the substrate after the exposure processing to a substrate inspection apparatus previously made to correspond to the identified exposure stage.
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