发明申请
US20160320713A1 SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TRANSFER METHOD, AND COMPUTER STORAGE MEDIUM 审中-公开
基板处理系统,基板传输方法和计算机存储介质

  • 专利标题: SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TRANSFER METHOD, AND COMPUTER STORAGE MEDIUM
  • 专利标题(中): 基板处理系统,基板传输方法和计算机存储介质
  • 申请号: US15105132
    申请日: 2014-10-30
  • 公开(公告)号: US20160320713A1
    公开(公告)日: 2016-11-03
  • 发明人: Takuya MORIMasaru TOMONO
  • 申请人: TOKYO ELECTRON LIMITED
  • 优先权: JP2013-269251 20131226
  • 国际申请: PCT/JP2014/078909 WO 20141030
  • 主分类号: G03F7/20
  • IPC分类号: G03F7/20 H01L21/67 H01L21/66 H01L21/677
SUBSTRATE TREATMENT SYSTEM, SUBSTRATE TRANSFER METHOD, AND COMPUTER STORAGE MEDIUM
摘要:
A substrate treatment system includes: a treatment station including a plurality of treatment apparatuses; an interface station which delivers a substrate to/from an exposure apparatus provided outside the system and including a plurality of exposure stages; a plurality of substrate inspection apparatuses; a substrate transfer mechanism which transfers the substrate between each of the treatment apparatuses in the treatment station and the substrate inspection apparatus; and a control apparatus which identifies an exposure stage which has been used in exposure processing of a substrate from among the plurality of exposure stages, and controls the substrate transfer mechanism to transfer the substrate after the exposure processing to a substrate inspection apparatus previously made to correspond to the identified exposure stage.
信息查询
0/0